Large Area Fabrication of Leaning Silicon Nanopillars for Surface Enhanced Raman Spectroscopy

Using a simple two step fabrication process substrates with a large and uniform Raman enhancement, based on flexible free standing nanopillars can be manufactured over large areas using readily available silicon processing equipment.

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Bibliographic Details
Published in:Advanced materials (Weinheim) 2012-03, Vol.24 (10), p.OP11-OP18
Main Authors: Schmidt, Michael Stenbæk, Hübner, Jörg, Boisen, Anja
Format: Article
Language:English
Subjects:
hot spots
leaning silicon nanopillars
maskless reactive ion etching
Nanostructures - chemistry
Nanotechnology - methods
Silicon - chemistry
Spectrum Analysis, Raman
substrate fabrication
surface enhanced raman spectroscopy
Surface Properties
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Description
Summary:Using a simple two step fabrication process substrates with a large and uniform Raman enhancement, based on flexible free standing nanopillars can be manufactured over large areas using readily available silicon processing equipment.
ISSN:0935-9648
1521-4095
DOI:10.1002/adma.201103496