Effect of monochromator X-ray Bragg reflection on photoelectric cross section

In XPS experiments employing monochromatized light, the X-ray Bragg reflection undergone by the beam at the monochromator crystal causes a partial polarization of the X-rays. The photoelectric cross section is affected since it depends on the angle between the electric field vector and the direction...

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Published in:Journal of electron spectroscopy and related phenomena 2010-11, Vol.182 (1), p.81-83
Main Author: Herrera-Gomez, A.
Format: Article
Language:English
Subjects:
Angular dependence
ARXPS
Bragg reflection
Photoelectric cross section
Polarization
XPS
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description In XPS experiments employing monochromatized light, the X-ray Bragg reflection undergone by the beam at the monochromator crystal causes a partial polarization of the X-rays. The photoelectric cross section is affected since it depends on the angle between the electric field vector and the direction of the escaping electrons. An expression for the photoelectric differential cross section is presented that accounts for the effect of the monochromator and of the geometrical configuration of the XPS tool.
doi_str_mv 10.1016/j.elspec.2010.07.009
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ispartof Journal of electron spectroscopy and related phenomena, 2010-11, Vol.182 (1), p.81-83
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source ScienceDirect Freedom Collection 2022-2024
subjects Angular dependence
ARXPS
Bragg reflection
Photoelectric cross section
Polarization
XPS
title Effect of monochromator X-ray Bragg reflection on photoelectric cross section
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