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Xenon difluoride plasma fluorination of polymer surfaces

Xenon difluoride (XeF 2) plasma treatment of a series of polymers containing different repeat units gives rise to varying levels of surface fluorination. Alkene and aromatic C–H bonds appear to be more susceptible towards reaction compared to their sp 3 counterparts. The extent of fluorine incorpora...

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Bibliographic Details
Published in:Polymer (Guilford) 2011-10, Vol.52 (23), p.5250-5254
Main Authors: Wheale, S.H., Badyal, J.P.S.
Format: Article
Language:English
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Summary:Xenon difluoride (XeF 2) plasma treatment of a series of polymers containing different repeat units gives rise to varying levels of surface fluorination. Alkene and aromatic C–H bonds appear to be more susceptible towards reaction compared to their sp 3 counterparts. The extent of fluorine incorporation can be accounted for in terms of a structure–behaviour relationship derived from extended Huckel molecular orbital calculations. Comparison with CF 4 plasma modification shows that XeF 2 electrical discharges are more effective at fluorinating polymer surfaces. [Display omitted]
ISSN:0032-3861
1873-2291
DOI:10.1016/j.polymer.2011.09.027