Rapid turnaround scanning probe nanolithography

Scanning probe nanolithography (SPL) has demonstrated its potential in a variety of applications like 3D nanopatterning, 'direct development' lithography, dip-pen deposition or patterning of self-assembled monolayers. One of the main issues holding back SPL has been the limited throughput...

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Published in:Nanotechnology 2011-07, Vol.22 (27), p.275306-275306
Main Authors: Paul, Philip C, Knoll, Armin W, Holzner, Felix, Despont, Michel, Duerig, Urs
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Language:English
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cited_by cdi_FETCH-LOGICAL-c456t-e32d9538137dcfb3140da7bb6adf066e88058fe3550bb80b1fb76f37454308953
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creator Paul, Philip C
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description Scanning probe nanolithography (SPL) has demonstrated its potential in a variety of applications like 3D nanopatterning, 'direct development' lithography, dip-pen deposition or patterning of self-assembled monolayers. One of the main issues holding back SPL has been the limited throughput for patterning and imaging. Here we present a complete lithography and metrology system based on thermomechanical writing into organic resists. Metrology is carried out using a thermoelectric topography sensing method. More specifically, we demonstrate a system with a patterning pixel clock of 500 kHz, 20 mm s(-1) linear scan speed, a positioning accuracy of 10 nm, a read-back frequency bandwidth of 100, 000 line-pairs s(-1) and a turnaround time from patterning to qualifying metrology of 1 min. Thus, we demonstrate a nanolithography system capable of implementing rapid turnaround.
doi_str_mv 10.1088/0957-4484/22/27/275306
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title Rapid turnaround scanning probe nanolithography
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