Nanoscale patterning of colloidal quantum dots on transparent and metallic planar surfaces

The patterning of colloidal quantum dots with nanometer resolution is essential for their application in photonics and plasmonics. Several patterning approaches, such as the use of polymer composites, molecular lock-and-key methods, inkjet printing and microcontact printing of quantum dots have been...

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Bibliographic Details
Published in:Nanotechnology 2012-09, Vol.23 (35), p.355302-1-6
Main Authors: Park, Yeonsang, Roh, Young-Geun, Kim, Un Jeong, Chung, Dae-Young, Suh, Hwansoo, Kim, Jineun, Cheon, Sangmo, Lee, Jaesoong, Kim, Tae-Ho, Cho, Kyung-Sang, Lee, Chang-Won
Format: Article
Language:English
Subjects:
Colloids
Inkjet printing
Nanocomposites
Nanomaterials
Nanostructure
Patterning
Photonics
Quantum dots
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Summary:The patterning of colloidal quantum dots with nanometer resolution is essential for their application in photonics and plasmonics. Several patterning approaches, such as the use of polymer composites, molecular lock-and-key methods, inkjet printing and microcontact printing of quantum dots have been recently developed. Herein, we present a simple method of patterning colloidal quantum dots for photonic nanostructures such as straight lines, rings and dot patterns either on transparent or metallic substrates. Sub-10 nm width of the patterned line could be achieved with a well-defined sidewall profile. Using this method, we demonstrate a surface plasmon launcher from a quantum dot cluster in the visible spectrum.
ISSN:0957-4484
1361-6528
DOI:10.1088/0957-4484/23/35/355302