A new sequential EBID process for the creation of pure Pt structures from MeCpPtMe3

Electron beam induced deposition (EBID) is a process used for the fabrication of three-dimensional nanostructures of a variety of materials, but direct deposition of pure metallic structures has rarely been achieved. Typically, MeCpPtMe3 as a precursor for Pt leads to a carbon rich deposit with ∼15...

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Bibliographic Details
Published in:Nanotechnology 2013-04, Vol.24 (14), p.145303
Main Authors: Mehendale, S, Mulders, J J L, Trompenaars, P H F
Format: Article
Language:English
Subjects:
Condensed matter: electronic structure, electrical, magnetic, and optical properties
Condensed matter: structure, mechanical and thermal properties
Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures
Electronic transport in multilayers, nanoscale materials and structures
Exact sciences and technology
Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties
Nanocrystalline materials
Physics
Radiation effects on specific materials
Structure of solids and liquids
crystallography
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
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Summary:Electron beam induced deposition (EBID) is a process used for the fabrication of three-dimensional nanostructures of a variety of materials, but direct deposition of pure metallic structures has rarely been achieved. Typically, MeCpPtMe3 as a precursor for Pt leads to a carbon rich deposit with ∼15 at.% Pt, which negatively affects its application as an electrical contact. We report a new process for Pt purification: in situ annealing with electron beam post-irradiation under oxygen flux, which can completely purify a thin (
ISSN:0957-4484
1361-6528
DOI:10.1088/0957-4484/24/14/145303