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A new sequential EBID process for the creation of pure Pt structures from MeCpPtMe3
Electron beam induced deposition (EBID) is a process used for the fabrication of three-dimensional nanostructures of a variety of materials, but direct deposition of pure metallic structures has rarely been achieved. Typically, MeCpPtMe3 as a precursor for Pt leads to a carbon rich deposit with ∼15...
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Published in: | Nanotechnology 2013-04, Vol.24 (14), p.145303 |
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creator | Mehendale, S Mulders, J J L Trompenaars, P H F |
description | Electron beam induced deposition (EBID) is a process used for the fabrication of three-dimensional nanostructures of a variety of materials, but direct deposition of pure metallic structures has rarely been achieved. Typically, MeCpPtMe3 as a precursor for Pt leads to a carbon rich deposit with ∼15 at.% Pt, which negatively affects its application as an electrical contact. We report a new process for Pt purification: in situ annealing with electron beam post-irradiation under oxygen flux, which can completely purify a thin ( |
doi_str_mv | 10.1088/0957-4484/24/14/145303 |
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fullrecord | <record><control><sourceid>pubmed_iop_j</sourceid><recordid>TN_cdi_pubmed_primary_23507998</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>23507998</sourcerecordid><originalsourceid>FETCH-LOGICAL-i284t-bea8c36523197b906df7e9dcd2e673ab7649d8a319b16c3c660016d9d24a14e93</originalsourceid><addsrcrecordid>eNpFkN1LwzAUxYMobk7_hZEXH-vy1Xw8zjl1sOFAfQ5pmmLH1tYkRfzvTdlUOHC53B-Xcw4AU4zuMJJyhlQuMsYkmxE2w4NyiugZGGPKccZzIs_B-A8agasQdghhLAm-BCNCcySUkmPwOoeN-4LBffauibXZw-X96gF2vrUuBFi1HsYPB613JtZtA9sKdr13cBthiL63MS0J8-0Bbtyi28aNo9fgojL74G5OcwLeH5dvi-ds_fK0WszXWU0ki1nhjLQ0WaVYiUIhXlbCqdKWxHFBTSE4U6U06VpgbqnlPAXgpSoJM5g5RSdgevzb9cXBlbrz9cH4b_2bLgG3J8AEa_aVN42twz8nCBOSkcSRI1e3nd61vW-SbY2RHqrWQ4t6aFETpvGgoWr6A5mJbSI</addsrcrecordid><sourcetype>Index Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>A new sequential EBID process for the creation of pure Pt structures from MeCpPtMe3</title><source>Institute of Physics:Jisc Collections:IOP Publishing Read and Publish 2024-2025 (Reading List)</source><creator>Mehendale, S ; Mulders, J J L ; Trompenaars, P H F</creator><creatorcontrib>Mehendale, S ; Mulders, J J L ; Trompenaars, P H F</creatorcontrib><description>Electron beam induced deposition (EBID) is a process used for the fabrication of three-dimensional nanostructures of a variety of materials, but direct deposition of pure metallic structures has rarely been achieved. Typically, MeCpPtMe3 as a precursor for Pt leads to a carbon rich deposit with ∼15 at.% Pt, which negatively affects its application as an electrical contact. We report a new process for Pt purification: in situ annealing with electron beam post-irradiation under oxygen flux, which can completely purify a thin (<100 nm) Pt EBID structure at substrate temperatures as low as 120 °C. We have developed a sequential method in which a thin Pt EBID structure is deposited on a previously purified structure and subsequently purified. The resistivity of the contact grown by this sequential procedure is observed to be ∼70 ± 8 μΩ cm-only six times higher than that of pure bulk Pt. Thus, sequential deposition and purification proves to be an effective method for fabricating pure Pt structures of desired dimensions.</description><identifier>ISSN: 0957-4484</identifier><identifier>EISSN: 1361-6528</identifier><identifier>DOI: 10.1088/0957-4484/24/14/145303</identifier><identifier>PMID: 23507998</identifier><identifier>CODEN: NNOTER</identifier><language>eng</language><publisher>Bristol: IOP Publishing</publisher><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties ; Condensed matter: structure, mechanical and thermal properties ; Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures ; Electronic transport in multilayers, nanoscale materials and structures ; Exact sciences and technology ; Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties ; Nanocrystalline materials ; Physics ; Radiation effects on specific materials ; Structure of solids and liquids; crystallography ; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</subject><ispartof>Nanotechnology, 2013-04, Vol.24 (14), p.145303</ispartof><rights>2013 IOP Publishing Ltd</rights><rights>2014 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=27247842$$DView record in Pascal Francis$$Hfree_for_read</backlink><backlink>$$Uhttps://www.ncbi.nlm.nih.gov/pubmed/23507998$$D View this record in MEDLINE/PubMed$$Hfree_for_read</backlink></links><search><creatorcontrib>Mehendale, S</creatorcontrib><creatorcontrib>Mulders, J J L</creatorcontrib><creatorcontrib>Trompenaars, P H F</creatorcontrib><title>A new sequential EBID process for the creation of pure Pt structures from MeCpPtMe3</title><title>Nanotechnology</title><addtitle>Nano</addtitle><addtitle>Nanotechnology</addtitle><description>Electron beam induced deposition (EBID) is a process used for the fabrication of three-dimensional nanostructures of a variety of materials, but direct deposition of pure metallic structures has rarely been achieved. Typically, MeCpPtMe3 as a precursor for Pt leads to a carbon rich deposit with ∼15 at.% Pt, which negatively affects its application as an electrical contact. We report a new process for Pt purification: in situ annealing with electron beam post-irradiation under oxygen flux, which can completely purify a thin (<100 nm) Pt EBID structure at substrate temperatures as low as 120 °C. We have developed a sequential method in which a thin Pt EBID structure is deposited on a previously purified structure and subsequently purified. The resistivity of the contact grown by this sequential procedure is observed to be ∼70 ± 8 μΩ cm-only six times higher than that of pure bulk Pt. Thus, sequential deposition and purification proves to be an effective method for fabricating pure Pt structures of desired dimensions.</description><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties</subject><subject>Condensed matter: structure, mechanical and thermal properties</subject><subject>Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures</subject><subject>Electronic transport in multilayers, nanoscale materials and structures</subject><subject>Exact sciences and technology</subject><subject>Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties</subject><subject>Nanocrystalline materials</subject><subject>Physics</subject><subject>Radiation effects on specific materials</subject><subject>Structure of solids and liquids; crystallography</subject><subject>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</subject><issn>0957-4484</issn><issn>1361-6528</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2013</creationdate><recordtype>article</recordtype><recordid>eNpFkN1LwzAUxYMobk7_hZEXH-vy1Xw8zjl1sOFAfQ5pmmLH1tYkRfzvTdlUOHC53B-Xcw4AU4zuMJJyhlQuMsYkmxE2w4NyiugZGGPKccZzIs_B-A8agasQdghhLAm-BCNCcySUkmPwOoeN-4LBffauibXZw-X96gF2vrUuBFi1HsYPB613JtZtA9sKdr13cBthiL63MS0J8-0Bbtyi28aNo9fgojL74G5OcwLeH5dvi-ds_fK0WszXWU0ki1nhjLQ0WaVYiUIhXlbCqdKWxHFBTSE4U6U06VpgbqnlPAXgpSoJM5g5RSdgevzb9cXBlbrz9cH4b_2bLgG3J8AEa_aVN42twz8nCBOSkcSRI1e3nd61vW-SbY2RHqrWQ4t6aFETpvGgoWr6A5mJbSI</recordid><startdate>20130412</startdate><enddate>20130412</enddate><creator>Mehendale, S</creator><creator>Mulders, J J L</creator><creator>Trompenaars, P H F</creator><general>IOP Publishing</general><general>Institute of Physics</general><scope>IQODW</scope><scope>NPM</scope></search><sort><creationdate>20130412</creationdate><title>A new sequential EBID process for the creation of pure Pt structures from MeCpPtMe3</title><author>Mehendale, S ; Mulders, J J L ; Trompenaars, P H F</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-i284t-bea8c36523197b906df7e9dcd2e673ab7649d8a319b16c3c660016d9d24a14e93</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2013</creationdate><topic>Condensed matter: electronic structure, electrical, magnetic, and optical properties</topic><topic>Condensed matter: structure, mechanical and thermal properties</topic><topic>Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures</topic><topic>Electronic transport in multilayers, nanoscale materials and structures</topic><topic>Exact sciences and technology</topic><topic>Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties</topic><topic>Nanocrystalline materials</topic><topic>Physics</topic><topic>Radiation effects on specific materials</topic><topic>Structure of solids and liquids; crystallography</topic><topic>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Mehendale, S</creatorcontrib><creatorcontrib>Mulders, J J L</creatorcontrib><creatorcontrib>Trompenaars, P H F</creatorcontrib><collection>Pascal-Francis</collection><collection>PubMed</collection><jtitle>Nanotechnology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Mehendale, S</au><au>Mulders, J J L</au><au>Trompenaars, P H F</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>A new sequential EBID process for the creation of pure Pt structures from MeCpPtMe3</atitle><jtitle>Nanotechnology</jtitle><stitle>Nano</stitle><addtitle>Nanotechnology</addtitle><date>2013-04-12</date><risdate>2013</risdate><volume>24</volume><issue>14</issue><spage>145303</spage><pages>145303-</pages><issn>0957-4484</issn><eissn>1361-6528</eissn><coden>NNOTER</coden><abstract>Electron beam induced deposition (EBID) is a process used for the fabrication of three-dimensional nanostructures of a variety of materials, but direct deposition of pure metallic structures has rarely been achieved. Typically, MeCpPtMe3 as a precursor for Pt leads to a carbon rich deposit with ∼15 at.% Pt, which negatively affects its application as an electrical contact. We report a new process for Pt purification: in situ annealing with electron beam post-irradiation under oxygen flux, which can completely purify a thin (<100 nm) Pt EBID structure at substrate temperatures as low as 120 °C. We have developed a sequential method in which a thin Pt EBID structure is deposited on a previously purified structure and subsequently purified. The resistivity of the contact grown by this sequential procedure is observed to be ∼70 ± 8 μΩ cm-only six times higher than that of pure bulk Pt. Thus, sequential deposition and purification proves to be an effective method for fabricating pure Pt structures of desired dimensions.</abstract><cop>Bristol</cop><pub>IOP Publishing</pub><pmid>23507998</pmid><doi>10.1088/0957-4484/24/14/145303</doi><tpages>7</tpages></addata></record> |
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subjects | Condensed matter: electronic structure, electrical, magnetic, and optical properties Condensed matter: structure, mechanical and thermal properties Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures Electronic transport in multilayers, nanoscale materials and structures Exact sciences and technology Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties Nanocrystalline materials Physics Radiation effects on specific materials Structure of solids and liquids crystallography Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) |
title | A new sequential EBID process for the creation of pure Pt structures from MeCpPtMe3 |
url | http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-06T05%3A06%3A56IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-pubmed_iop_j&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=A%20new%20sequential%20EBID%20process%20for%20the%20creation%20of%20pure%20Pt%20structures%20from%20MeCpPtMe3&rft.jtitle=Nanotechnology&rft.au=Mehendale,%20S&rft.date=2013-04-12&rft.volume=24&rft.issue=14&rft.spage=145303&rft.pages=145303-&rft.issn=0957-4484&rft.eissn=1361-6528&rft.coden=NNOTER&rft_id=info:doi/10.1088/0957-4484/24/14/145303&rft_dat=%3Cpubmed_iop_j%3E23507998%3C/pubmed_iop_j%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-i284t-bea8c36523197b906df7e9dcd2e673ab7649d8a319b16c3c660016d9d24a14e93%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_id=info:pmid/23507998&rfr_iscdi=true |