Study of correlation between plasma parameter and beam optics

Simultaneous measurement of negative ion source plasma and extracted beam is carried out in order to clarify a key plasma parameter governing the meniscus formation in negative ion sources for fusion. The plasma discharge is performed with various discharge powers at different bias voltages in order...

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Bibliographic Details
Published in:Review of scientific instruments 2020-02, Vol.91 (2), p.023503-023503
Main Authors: Kisaki, M., Nakano, H., Tsumori, K., Ikeda, K., Masaki, S., Haba, Y., Fujiwara, Y., Nagaoak, K., Osakabe, M.
Format: Article
Language:English
Subjects:
Bias
Correlation analysis
Electric potential
Ion density (concentration)
Ion sources
Ions
Negative ions
Parameters
Plasma
Plasma jets
Positive ions
Scientific apparatus & instruments
Voltage
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Summary:Simultaneous measurement of negative ion source plasma and extracted beam is carried out in order to clarify a key plasma parameter governing the meniscus formation in negative ion sources for fusion. The plasma discharge is performed with various discharge powers at different bias voltages in order to vary the plasma parameters. It is shown that the beam width changes along the same curve with respect to the negative ion density at any bias voltage while it varies along different curves with other plasma parameters depending on the bias voltage. This implies that the mechanism of meniscus formation in negative ion sources could be described along the similar manner as positive ion sources.
ISSN:0034-6748
1089-7623
DOI:10.1063/1.5131102