Development of a soft UV-NIL step&repeat and lift-off process chain for high speed metal nanomesh fabrication

In this work, we present a fabrication procedure of metal nanomesh arrays with the newly developed nanoimprint resist mr-NIL212FC used in a bi-layer resist system for a lift-off process. We comparatively analyzed and evaluated nanomeshes fabricated with a freshly prepared h-PDMS/PDMS stamp and a sta...

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Bibliographic Details
Published in:Nanotechnology 2020-08, Vol.31 (34), p.345301
Main Authors: Haslinger, M J, Mitteramskogler, T, Kopp, S, Leichtfried, H, Messerschmidt, M, Thesen, M W, Mühlberger, M
Format: Article
Language:English
Subjects:
high throughput NIL material
lift-off process
NIL
soft nanoimprint lithography
soft stamp
stamp degradation
stamp lifetime
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Summary:In this work, we present a fabrication procedure of metal nanomesh arrays with the newly developed nanoimprint resist mr-NIL212FC used in a bi-layer resist system for a lift-off process. We comparatively analyzed and evaluated nanomeshes fabricated with a freshly prepared h-PDMS/PDMS stamp and a stamp used 501 times. Therefore, we first performed a step&repeat imprint test run in a self-built low cost step&repeat UV-NIL setup. We inspected the imprint behavior of the stamp, the UV-transmission through the stamp as well as stamp lifetime and stamp degradation with regard to the possible changes of its surface roughness. The nanomesh fabrication process is characterized by a good lift-off performance, leading to a low defect density of
ISSN:0957-4484
1361-6528
DOI:10.1088/1361-6528/ab9130