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Sensitivity of Al-Doped Zinc-Oxide Extended Gate Field Effect Transistors to Low-Dose X-ray Radiation

Herein, we investigated the applicability of thick film and bulk disk forms of aluminum-doped zinc oxide (AZO) for low-dose X-ray radiation dosimetry using the extended gate field effect transistor (EGFET) configuration. The samples were fabricated using the chemical bath deposition (CBD) technique....

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Published in:Materials 2023-02, Vol.16 (5), p.1868
Main Authors: Ali, Amal Mohamed Ahmed, Ahmed, Naser M, Kabir, Norlaili A, Al-Diabat, Ahmad M, Algadri, Natheer A, Alsadig, Ahmed, Aldaghri, Osamah A, Ibnaouf, Khalid H
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creator Ali, Amal Mohamed Ahmed
Ahmed, Naser M
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Al-Diabat, Ahmad M
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Alsadig, Ahmed
Aldaghri, Osamah A
Ibnaouf, Khalid H
description Herein, we investigated the applicability of thick film and bulk disk forms of aluminum-doped zinc oxide (AZO) for low-dose X-ray radiation dosimetry using the extended gate field effect transistor (EGFET) configuration. The samples were fabricated using the chemical bath deposition (CBD) technique. A thick film of AZO was deposited on a glass substrate, while the bulk disk form was prepared by pressing the collected powders. The prepared samples were characterized via X-ray diffraction (XRD) and field emission scanning electron microscope (FESEM) to determine the crystallinity and surface morphology. The analyses show that the samples are crystalline and comprise nanosheets of varying sizes. The EGFET devices were exposed to different X-ray radiation doses, then characterized by measuring the I-V characteristics pre- and post-irradiation. The measurements revealed an increase in the values of drain-source currents with radiation doses. To study the detection efficiency of the device, various bias voltages were also tested for the linear and saturation regimes. Performance parameters of the devices, such as sensitivity to X-radiation exposure and different gate bias voltage, were found to depend highly on the device geometry. The bulk disk type appears to be more radiation-sensitive than the AZO thick film. Furthermore, boosting the bias voltage increased the sensitivity of both devices.
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1996-1944
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source Publicly Available Content Database; PubMed Central; Free Full-Text Journals in Chemistry
subjects Aluminum
Bias
Current voltage characteristics
Diffraction
Dosimeters
Dosimetry
Field effect transistors
Field emission microscopy
Glass substrates
Instrument industry
Nuclear energy
Parameter sensitivity
Radiation
Radiation dosage
Radiation effects
Semiconductor devices
Sensitivity
Sensors
X-rays
Zinc oxide
Zinc oxides
title Sensitivity of Al-Doped Zinc-Oxide Extended Gate Field Effect Transistors to Low-Dose X-ray Radiation
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