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Sensitivity of Al-Doped Zinc-Oxide Extended Gate Field Effect Transistors to Low-Dose X-ray Radiation
Herein, we investigated the applicability of thick film and bulk disk forms of aluminum-doped zinc oxide (AZO) for low-dose X-ray radiation dosimetry using the extended gate field effect transistor (EGFET) configuration. The samples were fabricated using the chemical bath deposition (CBD) technique....
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Published in: | Materials 2023-02, Vol.16 (5), p.1868 |
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creator | Ali, Amal Mohamed Ahmed Ahmed, Naser M Kabir, Norlaili A Al-Diabat, Ahmad M Algadri, Natheer A Alsadig, Ahmed Aldaghri, Osamah A Ibnaouf, Khalid H |
description | Herein, we investigated the applicability of thick film and bulk disk forms of aluminum-doped zinc oxide (AZO) for low-dose X-ray radiation dosimetry using the extended gate field effect transistor (EGFET) configuration. The samples were fabricated using the chemical bath deposition (CBD) technique. A thick film of AZO was deposited on a glass substrate, while the bulk disk form was prepared by pressing the collected powders. The prepared samples were characterized via X-ray diffraction (XRD) and field emission scanning electron microscope (FESEM) to determine the crystallinity and surface morphology. The analyses show that the samples are crystalline and comprise nanosheets of varying sizes. The EGFET devices were exposed to different X-ray radiation doses, then characterized by measuring the I-V characteristics pre- and post-irradiation. The measurements revealed an increase in the values of drain-source currents with radiation doses. To study the detection efficiency of the device, various bias voltages were also tested for the linear and saturation regimes. Performance parameters of the devices, such as sensitivity to X-radiation exposure and different gate bias voltage, were found to depend highly on the device geometry. The bulk disk type appears to be more radiation-sensitive than the AZO thick film. Furthermore, boosting the bias voltage increased the sensitivity of both devices. |
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The samples were fabricated using the chemical bath deposition (CBD) technique. A thick film of AZO was deposited on a glass substrate, while the bulk disk form was prepared by pressing the collected powders. The prepared samples were characterized via X-ray diffraction (XRD) and field emission scanning electron microscope (FESEM) to determine the crystallinity and surface morphology. The analyses show that the samples are crystalline and comprise nanosheets of varying sizes. The EGFET devices were exposed to different X-ray radiation doses, then characterized by measuring the I-V characteristics pre- and post-irradiation. The measurements revealed an increase in the values of drain-source currents with radiation doses. To study the detection efficiency of the device, various bias voltages were also tested for the linear and saturation regimes. Performance parameters of the devices, such as sensitivity to X-radiation exposure and different gate bias voltage, were found to depend highly on the device geometry. The bulk disk type appears to be more radiation-sensitive than the AZO thick film. Furthermore, boosting the bias voltage increased the sensitivity of both devices.</description><identifier>ISSN: 1996-1944</identifier><identifier>EISSN: 1996-1944</identifier><identifier>DOI: 10.3390/ma16051868</identifier><identifier>PMID: 36902983</identifier><language>eng</language><publisher>Switzerland: MDPI AG</publisher><subject>Aluminum ; Bias ; Current voltage characteristics ; Diffraction ; Dosimeters ; Dosimetry ; Field effect transistors ; Field emission microscopy ; Glass substrates ; Instrument industry ; Nuclear energy ; Parameter sensitivity ; Radiation ; Radiation dosage ; Radiation effects ; Semiconductor devices ; Sensitivity ; Sensors ; X-rays ; Zinc oxide ; Zinc oxides</subject><ispartof>Materials, 2023-02, Vol.16 (5), p.1868</ispartof><rights>COPYRIGHT 2023 MDPI AG</rights><rights>2023 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/). 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Performance parameters of the devices, such as sensitivity to X-radiation exposure and different gate bias voltage, were found to depend highly on the device geometry. The bulk disk type appears to be more radiation-sensitive than the AZO thick film. Furthermore, boosting the bias voltage increased the sensitivity of both devices.</description><subject>Aluminum</subject><subject>Bias</subject><subject>Current voltage characteristics</subject><subject>Diffraction</subject><subject>Dosimeters</subject><subject>Dosimetry</subject><subject>Field effect transistors</subject><subject>Field emission microscopy</subject><subject>Glass substrates</subject><subject>Instrument industry</subject><subject>Nuclear energy</subject><subject>Parameter sensitivity</subject><subject>Radiation</subject><subject>Radiation dosage</subject><subject>Radiation effects</subject><subject>Semiconductor devices</subject><subject>Sensitivity</subject><subject>Sensors</subject><subject>X-rays</subject><subject>Zinc oxide</subject><subject>Zinc oxides</subject><issn>1996-1944</issn><issn>1996-1944</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2023</creationdate><recordtype>article</recordtype><sourceid>PIMPY</sourceid><recordid>eNptkl1rFDEUhoMottTe-AMk4I0IUydfM5MrWeq2CgsF3QvxJmSSk5oyk6xJtnb_vVla-yEmFwknz_uG83IQek3aE8Zk-2HWpGsFGbrhGTokUnYNkZw_f3Q_QMc5X7V1MUYGKl-iA9bJlsqBHSL4BiH74q992eHo8GJqPsUNWPzDB9Nc3HgLeHlTINhaO9cF8JmHyeKlc2AKXidd5bnElHGJeBV_V3kG_L1Jeoe_aut18TG8Qi-cnjIc351HaH22XJ9-blYX519OF6vG8J6XxvFOsB5sRxiRwhkNVHCpneiMkNKCHHkv5Ehpb6yjltGRMTbyFkY7jE6yI_Tx1nazHWewBkJJelKb5Geddipqr56-BP9TXcZrRWo4nLChOry7c0jx1xZyUbPPBqZJB4jbrGg_dK0UTNCKvv0HvYrbFGp7e6oCNXvxQF3qCZQPLtaPzd5ULXpOBi4kYZU6-Q9Vt4XZmxjA-Vp_Inh_KzAp5pzA3TdJWrWfC_UwFxV-8ziWe_TvFLA_Awmw8w</recordid><startdate>20230224</startdate><enddate>20230224</enddate><creator>Ali, Amal Mohamed Ahmed</creator><creator>Ahmed, Naser M</creator><creator>Kabir, Norlaili A</creator><creator>Al-Diabat, Ahmad M</creator><creator>Algadri, Natheer A</creator><creator>Alsadig, Ahmed</creator><creator>Aldaghri, Osamah A</creator><creator>Ibnaouf, Khalid H</creator><general>MDPI AG</general><general>MDPI</general><scope>NPM</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>8FD</scope><scope>8FE</scope><scope>8FG</scope><scope>ABJCF</scope><scope>ABUWG</scope><scope>AFKRA</scope><scope>AZQEC</scope><scope>BENPR</scope><scope>BGLVJ</scope><scope>CCPQU</scope><scope>D1I</scope><scope>DWQXO</scope><scope>HCIFZ</scope><scope>JG9</scope><scope>KB.</scope><scope>PDBOC</scope><scope>PIMPY</scope><scope>PQEST</scope><scope>PQQKQ</scope><scope>PQUKI</scope><scope>PRINS</scope><scope>7X8</scope><scope>5PM</scope><orcidid>https://orcid.org/0000-0001-8829-707X</orcidid><orcidid>https://orcid.org/0000-0001-8601-7345</orcidid><orcidid>https://orcid.org/0000-0003-1146-9456</orcidid><orcidid>https://orcid.org/0000-0001-7990-6099</orcidid><orcidid>https://orcid.org/0000-0002-6397-7391</orcidid></search><sort><creationdate>20230224</creationdate><title>Sensitivity of Al-Doped Zinc-Oxide Extended Gate Field Effect Transistors to Low-Dose X-ray Radiation</title><author>Ali, Amal Mohamed Ahmed ; Ahmed, Naser M ; Kabir, Norlaili A ; Al-Diabat, Ahmad M ; Algadri, Natheer A ; Alsadig, Ahmed ; Aldaghri, Osamah A ; Ibnaouf, Khalid H</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c474t-f46537ed613195fcae2549af56c599de9b4759b227cdf2d32b333b40ebd8bf93</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2023</creationdate><topic>Aluminum</topic><topic>Bias</topic><topic>Current voltage characteristics</topic><topic>Diffraction</topic><topic>Dosimeters</topic><topic>Dosimetry</topic><topic>Field effect transistors</topic><topic>Field emission microscopy</topic><topic>Glass substrates</topic><topic>Instrument industry</topic><topic>Nuclear energy</topic><topic>Parameter sensitivity</topic><topic>Radiation</topic><topic>Radiation dosage</topic><topic>Radiation effects</topic><topic>Semiconductor devices</topic><topic>Sensitivity</topic><topic>Sensors</topic><topic>X-rays</topic><topic>Zinc oxide</topic><topic>Zinc oxides</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Ali, Amal Mohamed Ahmed</creatorcontrib><creatorcontrib>Ahmed, Naser M</creatorcontrib><creatorcontrib>Kabir, Norlaili A</creatorcontrib><creatorcontrib>Al-Diabat, Ahmad M</creatorcontrib><creatorcontrib>Algadri, Natheer A</creatorcontrib><creatorcontrib>Alsadig, Ahmed</creatorcontrib><creatorcontrib>Aldaghri, Osamah A</creatorcontrib><creatorcontrib>Ibnaouf, Khalid H</creatorcontrib><collection>PubMed</collection><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>Technology Research Database</collection><collection>ProQuest SciTech Collection</collection><collection>ProQuest Technology Collection</collection><collection>Materials Science & Engineering Collection</collection><collection>ProQuest Central (Alumni)</collection><collection>ProQuest Central</collection><collection>ProQuest Central Essentials</collection><collection>ProQuest Central</collection><collection>Technology Collection</collection><collection>ProQuest One Community College</collection><collection>ProQuest Materials Science Collection</collection><collection>ProQuest Central</collection><collection>SciTech Premium Collection</collection><collection>Materials Research Database</collection><collection>Materials Science Database</collection><collection>Materials Science Collection</collection><collection>Publicly Available Content Database</collection><collection>ProQuest One Academic Eastern Edition (DO NOT USE)</collection><collection>ProQuest One Academic</collection><collection>ProQuest One Academic UKI Edition</collection><collection>ProQuest Central China</collection><collection>MEDLINE - Academic</collection><collection>PubMed Central (Full Participant titles)</collection><jtitle>Materials</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Ali, Amal Mohamed Ahmed</au><au>Ahmed, Naser M</au><au>Kabir, Norlaili A</au><au>Al-Diabat, Ahmad M</au><au>Algadri, Natheer A</au><au>Alsadig, Ahmed</au><au>Aldaghri, Osamah A</au><au>Ibnaouf, Khalid H</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Sensitivity of Al-Doped Zinc-Oxide Extended Gate Field Effect Transistors to Low-Dose X-ray Radiation</atitle><jtitle>Materials</jtitle><addtitle>Materials (Basel)</addtitle><date>2023-02-24</date><risdate>2023</risdate><volume>16</volume><issue>5</issue><spage>1868</spage><pages>1868-</pages><issn>1996-1944</issn><eissn>1996-1944</eissn><abstract>Herein, we investigated the applicability of thick film and bulk disk forms of aluminum-doped zinc oxide (AZO) for low-dose X-ray radiation dosimetry using the extended gate field effect transistor (EGFET) configuration. The samples were fabricated using the chemical bath deposition (CBD) technique. A thick film of AZO was deposited on a glass substrate, while the bulk disk form was prepared by pressing the collected powders. The prepared samples were characterized via X-ray diffraction (XRD) and field emission scanning electron microscope (FESEM) to determine the crystallinity and surface morphology. The analyses show that the samples are crystalline and comprise nanosheets of varying sizes. The EGFET devices were exposed to different X-ray radiation doses, then characterized by measuring the I-V characteristics pre- and post-irradiation. The measurements revealed an increase in the values of drain-source currents with radiation doses. To study the detection efficiency of the device, various bias voltages were also tested for the linear and saturation regimes. Performance parameters of the devices, such as sensitivity to X-radiation exposure and different gate bias voltage, were found to depend highly on the device geometry. The bulk disk type appears to be more radiation-sensitive than the AZO thick film. Furthermore, boosting the bias voltage increased the sensitivity of both devices.</abstract><cop>Switzerland</cop><pub>MDPI AG</pub><pmid>36902983</pmid><doi>10.3390/ma16051868</doi><orcidid>https://orcid.org/0000-0001-8829-707X</orcidid><orcidid>https://orcid.org/0000-0001-8601-7345</orcidid><orcidid>https://orcid.org/0000-0003-1146-9456</orcidid><orcidid>https://orcid.org/0000-0001-7990-6099</orcidid><orcidid>https://orcid.org/0000-0002-6397-7391</orcidid><oa>free_for_read</oa></addata></record> |
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subjects | Aluminum Bias Current voltage characteristics Diffraction Dosimeters Dosimetry Field effect transistors Field emission microscopy Glass substrates Instrument industry Nuclear energy Parameter sensitivity Radiation Radiation dosage Radiation effects Semiconductor devices Sensitivity Sensors X-rays Zinc oxide Zinc oxides |
title | Sensitivity of Al-Doped Zinc-Oxide Extended Gate Field Effect Transistors to Low-Dose X-ray Radiation |
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