Fabrication of High-Aspect-Ratio Metallic Nanostructures Using Nanoskiving

This communication describes the fabrication of gold structures (for example, rings) with wall thickness of 40 nm, and with high aspect ratios up to 25. This technique combines thin-film deposition of metal on a topographically patterned epoxy substrate, with nanometer-scale sectioning using a micro...

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Bibliographic Details
Published in:Nano letters 2006-09, Vol.6 (9), p.2163-2165
Main Authors: Xu, Qiaobing, Perez-Castillejos, Raquel, Li, Zhefeng, Whitesides, George M
Format: Article
Language:English
Subjects:
Cross-disciplinary physics: materials science
rheology
Crystallization - methods
Exact sciences and technology
Gold - chemistry
Materials science
Materials Testing
Methods of deposition of films and coatings
film growth and epitaxy
Molecular Conformation
Nanostructures - chemistry
Nanostructures - ultrastructure
Nanotechnology - methods
Particle Size
Physics
Surface Properties
Surface treatments
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Summary:This communication describes the fabrication of gold structures (for example, rings) with wall thickness of 40 nm, and with high aspect ratios up to 25. This technique combines thin-film deposition of metal on a topographically patterned epoxy substrate, with nanometer-scale sectioning using a microtome in a plane parallel to the patterned substrate. The dimensions of the metal structures are determined by the thickness of the metal film and the thickness of the epoxy sections. The shape of the resulting nanostructure is defined by the cross section of the original template.
ISSN:1530-6984
1530-6992
DOI:10.1021/nl0615672