Silicon-based photonic crystals fabricated using proton beam writing combined with electrochemical etching method

A method for fabrication of three-dimensional (3D) silicon nanostructures based on selective formation of porous silicon using ion beam irradiation of bulk p-type silicon followed by electrochemical etching is shown. It opens a route towards the fabrication of two-dimensional (2D) and 3D silicon-bas...

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Bibliographic Details
Published in:Nanoscale research letters 2012-07, Vol.7 (1), p.416-416, Article 416
Main Authors: Dang, Zhiya, Breese, Mark BH, Recio-Sánchez, Gonzalo, Azimi, Sara, Song, Jiao, Liang, Haidong, Banas, Agnieszka, Torres-Costa, Vicente, Martín-Palma, Raúl José
Format: Article
Language:English
Subjects:
Chemistry and Materials Science
Materials Science
Molecular Medicine
Nano Express
Nanochemistry
Nanoscale Science and Technology
Nanotechnology
Nanotechnology and Microengineering
Porous Semiconductors - Science and Technology 2012
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Summary:A method for fabrication of three-dimensional (3D) silicon nanostructures based on selective formation of porous silicon using ion beam irradiation of bulk p-type silicon followed by electrochemical etching is shown. It opens a route towards the fabrication of two-dimensional (2D) and 3D silicon-based photonic crystals with high flexibility and industrial compatibility. In this work, we present the fabrication of 2D photonic lattice and photonic slab structures and propose a process for the fabrication of 3D woodpile photonic crystals based on this approach. Simulated results of photonic band structures for the fabricated 2D photonic crystals show the presence of TE or TM gap in mid-infrared range.
ISSN:1556-276X
1931-7573
1556-276X
DOI:10.1186/1556-276X-7-416