Plow and Ridge Nanofabrication

Traditionally, scanning probe lithography tools are limited in resolution by the radius of curvature of the tip used. Herein, an approach is described for patterning the ridge of piled‐up polymer that naturally occurs when a scanning probe is pressed against a soft surface. The use of this phenomeno...

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Bibliographic Details
Published in:Small (Weinheim an der Bergstrasse, Germany) Germany), 2013-09, Vol.9 (18), p.3058-3062
Main Authors: Shim, Wooyoung, Brown, Keith A., Zhou, Xiaozhu, Rasin, Boris, Liao, Xing, Schmucker, Abrin L., Mirkin, Chad A.
Format: Article
Language:English
Subjects:
atomic force microscopy
Lithography
Microscopy, Atomic Force
Nanocomposites
nanofabrication
nanolithography
Nanomaterials
Nanostructure
Nanostructures - chemistry
Nanotechnology
Nanotechnology - methods
Patterning
Plows
polymers
Ridges
Scanning
scanning probe microscopy
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Description
Summary:Traditionally, scanning probe lithography tools are limited in resolution by the radius of curvature of the tip used. Herein, an approach is described for patterning the ridge of piled‐up polymer that naturally occurs when a scanning probe is pressed against a soft surface. The use of this phenomenon to transfer patterns to hard materials with 20 nm resolution is demonstrated.
ISSN:1613-6810
1613-6829
DOI:10.1002/smll.201203014