Pushing the resolution of photolithography down to 15nm by surface plasmon interference

A deep ultraviolet plasmonic structure is designed and a surface plasmon interference lithography method using the structure is proposed to generate large-area periodic nanopatterns. By exciting the anti-symmetric coupled surface plasmon polaritons in the structure, ultrahigh resolution periodic pat...

Full description

Saved in:
Bibliographic Details
Published in:Scientific reports 2014-07, Vol.4 (1), p.5618-5618, Article 5618
Main Authors: Dong, Jianjie, Liu, Juan, Kang, Guoguo, Xie, Jinghui, Wang, Yongtian
Format: Article
Language:English
Subjects:
142/126
639/624/1107/1109
639/624/400/1021
Electric fields
Humanities and Social Sciences
Illumination
multidisciplinary
Photolithography
Propagation
Science
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:A deep ultraviolet plasmonic structure is designed and a surface plasmon interference lithography method using the structure is proposed to generate large-area periodic nanopatterns. By exciting the anti-symmetric coupled surface plasmon polaritons in the structure, ultrahigh resolution periodic patterns can be formed in a photoresist. The resolution of the generated patterns can be tuned by changing the refractive index and thickness of the photoresist. We demonstrate numerically that one-dimensional and two-dimensional patterns with a half-pitch resolution of 14.6 nm can be generated in a 25 nm-thick photoresist by using the structure under 193 nm illumination. Furthermore, the half-pitch resolution of the generated patterns can be down to 13 nm if high refractive index photoresists are used. Our findings open up an avenue to push the half-pitch resolution of photolithography towards 10 nm.
ISSN:2045-2322
2045-2322
DOI:10.1038/srep05618