Substrate topography guides pore morphology evolution in nanoporous gold thin films

[Display omitted] This paper illustrates the effect of substrate topography on morphology evolution in nanoporous gold (np-Au) thin films. One micron-high silicon ridges with widths varying between 150nm and 50μm were fabricated and coated with 500nm-thick np-Au films obtained by dealloying sputtere...

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Bibliographic Details
Published in:Scripta materialia 2016-01, Vol.110, p.33-36
Main Authors: Chapman, Christopher A.R., Daggumati, Pallavi, Gott, Shannon C., Rao, Masaru P., Seker, Erkin
Format: Article
Language:English
Subjects:
Annealing
Dealloying
Evolution
Fracture
Gold
Microfabrication
Morphology
Nanoporous material
Nanostructure
Ridges
Thin films
Topography
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Summary:[Display omitted] This paper illustrates the effect of substrate topography on morphology evolution in nanoporous gold (np-Au) thin films. One micron-high silicon ridges with widths varying between 150nm and 50μm were fabricated and coated with 500nm-thick np-Au films obtained by dealloying sputtered gold–silver alloy films. Analysis of scanning electron micrographs of the np-Au films following dealloying and thermal annealing revealed two distinct regimes where the ratio of film thickness to ridge width determines the morphological evolution of np-Au films.
ISSN:1359-6462
1872-8456
DOI:10.1016/j.scriptamat.2015.07.039