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Ultra-low Doping on Two-Dimensional Transition Metal Dichalcogenides using DNA Nanostructure Doped by a Combination of Lanthanide and Metal Ions
Here, we propose a novel DNA-based doping method on MoS 2 and WSe 2 films, which enables ultra-low n- and p-doping control and allows for proper adjustments in device performance. This is achieved by selecting and/or combining different types of divalent metal and trivalent lanthanide (Ln) ions on D...
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Published in: | Scientific reports 2016-02, Vol.6 (1), p.20333, Article 20333 |
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Main Authors: | , , , , , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Here, we propose a novel DNA-based doping method on MoS
2
and WSe
2
films, which enables ultra-low n- and p-doping control and allows for proper adjustments in device performance. This is achieved by selecting and/or combining different types of divalent metal and trivalent lanthanide (Ln) ions on DNA nanostructures, using the newly proposed concept of Co-DNA (DNA functionalized by both divalent metal and trivalent Ln ions). The available n-doping range on the MoS
2
by Ln-DNA is between 6 × 10
9
and 2.6 × 10
10
cm
−2
. The p-doping change on WSe
2
by Ln-DNA is adjusted between −1.0 × 10
10
and −2.4 × 10
10
cm
−2
. In Eu
3+
or Gd
3+
-Co-DNA doping, a light p-doping is observed on MoS
2
and WSe
2
(~10
10
cm
−2
). However, in the devices doped by Tb
3+
or Er
3+
-Co-DNA, a light n-doping (~10
10
cm
−2
) occurs. A significant increase in on-current is also observed on the MoS
2
and WSe
2
devices, which are, respectively, doped by Tb
3+
- and Gd
3+
-Co-DNA, due to the reduction of effective barrier heights by the doping. In terms of optoelectronic device performance, the Tb
3+
or Er
3+
-Co-DNA (n-doping) and the Eu
3+
or Gd
3+
-Co-DNA (p-doping) improve the MoS
2
and WSe
2
photodetectors, respectively. We also show an excellent absorbing property by Tb
3+
ions on the TMD photodetectors. |
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ISSN: | 2045-2322 2045-2322 |
DOI: | 10.1038/srep20333 |