Phosphoric and carboxylic methacrylate esters as bonding agents in self-adhesive resin cements

The aim of the present study was to investigate the effect of pH and phosphoric ester structure (phosphonate or phosphate) on the bond strength of different dental restorative materials. The following three self-adhesive resin cements were used in the present study: RelyX Unicem, Maxcem and Multilin...

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Bibliographic Details
Published in:Experimental and therapeutic medicine 2018-05, Vol.15 (5), p.4531-4537
Main Authors: Liu, Wenshu, Meng, Hongmei, Sun, Zhiguang, Jiang, Riwen, Dong, Chang-An, Zhang, Congxiao
Format: Article
Language:English
Subjects:
Acids
Adhesion
Adhesives
Analysis
Bond strength
Cement
Composite materials
Curing
Dental materials
Dentin
Enamel
Etching
Hydroxyapatite
Influence
Phosphoric acid
Physiological aspects
Teeth
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Summary:The aim of the present study was to investigate the effect of pH and phosphoric ester structure (phosphonate or phosphate) on the bond strength of different dental restorative materials. The following three self-adhesive resin cements were used in the present study: RelyX Unicem, Maxcem and Multilink Sprint The pH of each cement was measured using a pH meter. The cements were used to attach a variety of restorative materials to human dentin and the bond strength was measured by assessing shear strength using a universal testing machine. The pH values of RelyX Unicem, Maxcem and Multilink Sprint were 3.78, 1.78 and 3.42, respectively. Maxcem, a phosphate-based self-adhesive cement, was demonstrated to form the weakest bonds. No significant difference in bond strength was observed between RelyX Unicem and Multilink Sprint, which are phosphonate-based cements. The results of the present study suggest that the chemical structure of the functional monomer influences the performance of an adhesive material. Furthermore, the pH of acidic functional monomers containing phosphonate or phosphate groups has an effect on the strength of bonds formed between dentin and restorative materials.
ISSN:1792-0981
1792-1015
DOI:10.3892/etm.2018.5937