Synthesis of carboxylated silicon phthalocyanine photosensitive microspheres with controllable etching

Using a new kind of alkenyl silicon phthalocyanine, styrene (St) and methacrylic acid as monomers and potassium persulfate as an initiator, carboxylated silicon phthalocyanine photosensitive microspheres were synthesized by in-situ emulsion copolymerization. The structure and morphology of the micro...

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Bibliographic Details
Published in:Designed monomers and polymers 2019-01, Vol.22 (1), p.98-105
Main Authors: Liu, Dan-Dan, Wang, Yu, Han, Guo-Zhi
Format: Article
Language:English
Subjects:
carboxylated
controllable etching
photosensitive microsphere
Silicon phthalocyanine
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Summary:Using a new kind of alkenyl silicon phthalocyanine, styrene (St) and methacrylic acid as monomers and potassium persulfate as an initiator, carboxylated silicon phthalocyanine photosensitive microspheres were synthesized by in-situ emulsion copolymerization. The structure and morphology of the microspheres were characterized by Fourier transform infrared spectroscopy (FT-IR)and scanning electron microscopy. Fluorescence spectrometer was used to characterize the optical property of the microspheres. The experimental results show that silicon phthalocyanine molecules with flexible unsaturated side chains have good compatibility with styrene. With the presence of carboxyl groups, the as-prepared photosensitive microspheres show high monodispersity and stability. On the basis of this, 9,10-diphenylanthracene (DPA) as singlet oxygen indicator was used to evaluate the photosensitivity of the microspheres. In addition, we report a novel phenomenon that the microspheres can be controllable etched by light irradiation with the presence of DPA in a specific solvent.
ISSN:1385-772X
1568-5551
1568-5551
DOI:10.1080/15685551.2019.1603695