Dynamic Supramolecular Ruthenium‐Based Gels Responsive to Visible/NIR Light and Heat

A simple supramolecular crosslinked gel is reported with a photosensitive ruthenium bipyridine complex functioning as a crosslinker and poly(4‐vinylpyridine) (P4VP) as a macromolecular ligand. Irradiation of the organogels in H2O/MeOH with visible and NIR light (in a multiphoton process) leads to cl...

Full description

Saved in:
Bibliographic Details
Published in:Chemistry : a European journal 2019-07, Vol.25 (42), p.9851-9855
Main Authors: Teasdale, Ian, Theis, Sabrina, Iturmendi, Aitziber, Strobel, Moritz, Hild, Sabine, Jacak, Jaroslaw, Mayrhofer, Philipp, Monkowius, Uwe
Format: Article
Language:English
Subjects:
Chemistry
Communication
Communications
Crosslinking
Direct laser writing
Gels
Irradiation
Ligands
Macromolecules
metallopolymers
Micropatterning
multiphoton absorption
Photoresists
photosensitive gels
Photosensitivity
Pyridines
Restoration
Ruthenium
Ruthenium compounds
self-healing
Solubilization
Thin films
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:A simple supramolecular crosslinked gel is reported with a photosensitive ruthenium bipyridine complex functioning as a crosslinker and poly(4‐vinylpyridine) (P4VP) as a macromolecular ligand. Irradiation of the organogels in H2O/MeOH with visible and NIR light (in a multiphoton process) leads to cleavage of pyridine moieties from the ruthenium complex breaking the cross‐links and causing degelation and hence solubilization of the P4VP chains. Real‐time (RT) photorheology experiments of thin films showed a rapid degelation in several seconds, whereas larger bulk samples could also be photocleaved. Furthermore, the gels could be reformed or healed by simple heating of the system and restoration of the metal–ligand crosslinks. The relatively simple dynamic system with a high sensitivity towards light in the visible and NIR region make them interesting positive photoresists for nano/micropatterning applications, as was demonstrated by writing, erasing, and rewriting of the gels by single‐ and multiphoton lithography. Polymer etch a sketch: A simple supramolecular crosslinked gel of polyvinylpyridine (P4VP) with a photosensitive ruthenium bipyridine crosslinker shows reversible gelation upon exposure to light and heat allowing writing, erasing, and rewriting using one‐ or multiphoton lithography
ISSN:0947-6539
1521-3765
1521-3765
DOI:10.1002/chem.201902088