Deposition of Thin Alumina Films Containing 3D Ordered Network of Nanopores on Porous Substrates

Self-supporting thin films containing nanopores are very promising materials for use for multiple applications, especially in nanofiltration. Here, we present a method for the production of nanomembranes containing a 3D ordered network of nanopores in an alumina matrix, with a diameter of about 1 nm...

Full description

Saved in:
Bibliographic Details
Published in:Materials 2020-06, Vol.13 (13), p.2883
Main Authors: Tkalčević, Marija, Gotić, Marijan, Basioli, Lovro, Lihter, Martina, Dražić, Goran, Bernstorff, Sigrid, Vuletić, Tomislav, Mičetić, Maja
Format: Article
Language:English
Subjects:
Alumina
Aluminum oxide
Annealing
Deposition
Diameters
Film thickness
Magnetron sputtering
Membranes
Nanofiltration
Nanowires
Pore size
Porosity
Porous materials
Quantum dots
Substrates
Thin films
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:Self-supporting thin films containing nanopores are very promising materials for use for multiple applications, especially in nanofiltration. Here, we present a method for the production of nanomembranes containing a 3D ordered network of nanopores in an alumina matrix, with a diameter of about 1 nm and a body centered tetragonal structure of the network nodes. The material is produced by the magnetron sputtering deposition of a 3D ordered network of Ge nanowires in an alumina matrix, followed by a specific annealing process resulting in the evaporation of Ge. We demonstrate that the films can be easily grown on commercially available alumina substrates containing larger pores with diameters between 20 and 400 nm. We have determined the minimal film thickness needed to entirely cover the larger pores. We believe that these films have the potential for applications in the fields of filtration, separation and sensing.
ISSN:1996-1944
1996-1944
DOI:10.3390/ma13132883