Factors associated with mask wearing among psychiatric inpatients during the COVID-19 pandemic

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Bibliographic Details
Published in:Schizophrenia research 2021-02, Vol.228, p.235-236
Main Authors: Jung, Ha-Ran, Park, Cheol, Kim, Mina, Jhon, Min, Kim, Ju-Wan, Ryu, Seunghyong, Lee, Ju-Yeon, Kim, Jae-Min, Park, Kyung-Hwa, Jung, Sook-In, Yoon, Bo-Hyun, Kim, Sung-Wan
Format: Article
Language:English
Subjects:
COVID-19
Face mask
Humans
Inpatients
Invited
Knowledge
Masks
Mass infection
Pandemics
SARS-CoV-2
Schizophrenia
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ISSN:0920-9964
1573-2509
DOI:10.1016/j.schres.2020.12.029