Quantification of Carbonic Contamination of Fused Silica Surfaces at Different Stages of Classical Optics Manufacturing

The chemical composition of ground and polished fused silica glass surfaces plays a decisive role in different applications of optics. In particular, a high level of carbon impurities is often undesirable for further processing and especially for gluing or cementing where adhesion failure may be att...

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Bibliographic Details
Published in:Materials 2021-03, Vol.14 (7), p.1620
Main Authors: Köhler, Robert, Hellrung, Domenico, Tasche, Daniel, Gerhard, Christoph
Format: Article
Language:English
Subjects:
Atomic force microscopy
Carbon
Carbon content
Cementing
Chemical composition
Contaminants
Contamination
Fused silica
Glass
Gluing
Grain size
Hydrocarbons
Investigations
Lasers
Manufacturing
Optics
Photoelectrons
Polyurethane resins
Silica glass
Silicon carbide
Silicon dioxide
Spectrum analysis
Surface roughness
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Summary:The chemical composition of ground and polished fused silica glass surfaces plays a decisive role in different applications of optics. In particular, a high level of carbon impurities is often undesirable for further processing and especially for gluing or cementing where adhesion failure may be attributed to carbonic surface-adherent contaminants. In this study, the surface carbon content at different stages of classical optics manufacturing was thus investigated. Two different standard processes-grinding and lapping with two final polishing processes using both polyurethane and pitch pads-were considered. After each process step, the chemical composition and roughness of the surface were analysed using X-ray photoelectron spectroscopy and atomic force microscopy. An obvious correlation between surface roughness and effective surface area, respectively, and the proportion of carbon contamination was observed. The lowest carbon contamination was found in case of lapped and pitch polished surfaces.
ISSN:1996-1944
1996-1944
DOI:10.3390/ma14071620