Large Area Patterning of Nanoparticles and Nanostructures: Current Status and Future Prospects

• Published in: ACS nano 2021-04, Vol.15 (4), p.5861-5875
• Main Authors: Barad, Hannah-Noa, Kwon, Hyunah, Alarcón-Correa, Mariana, Fischer, Peer
• Format: Article
• Language: English
• Subjects: Review
• ISSN: 1936-0851; 1936-086X
• DOI: 10.1021/acsnano.0c09999

Nanoparticles possess exceptional optical, magnetic, electrical, and chemical properties. Several applications, ranging from surfaces for optical displays and electronic devices, to energy conversion, require large-area patterns of nanoparticles. Often, it is crucial to maintain a defined arrangement and spacing between nanoparticles to obtain a consistent and uniform surface response. In the majority of the established patterning methods, the pattern is written and formed, which is slow and not scalable. Some parallel techniques, forming all points of the pattern simultaneously, have therefore emerged. These methods can be used to quickly assemble nanoparticles and nanostructures on large-area substrates into well-ordered patterns. Here, we review these parallel methods, the materials that have been processed by them, and the types of particles that can be used with each method. We also emphasize the maximal substrate areas that each method can pattern and the distances between particles. Finally, we point out the advantages and disadvantages of each method, as well as the challenges that still need to be addressed to enable facile, on-demand large-area nanopatterning.