Study on the Physical Properties of a SiNW Biosensor to the Sensitivity of DNA Detection

SiNW (silicon nanowire) arrays consisting of 5- and 10-wires were fabricated by using an atomic force microscope—the local anodic oxidation (AFM-LAO) technique followed by wet chemical etching. Tetramethylammonium hydroxide (TMAH) and isopropyl alcohol (IPA) at various concentrations were used to et...

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Bibliographic Details
Published in:Materials 2021-09, Vol.14 (19), p.5716
Main Authors: Yusoh, Siti Noorhaniah, Yaacob, Khatijah Aisha
Format: Article
Language:English
Subjects:
Anodizing
Atomic force microscopes
Atomic force microscopy
Biosensors
Chemical etching
Dengue fever
Deoxyribonucleic acid
DNA
Etching
Hydrogen
Isopropanol
Nanowires
Oxidation
Physical properties
Sensitivity
Silicon
Surface roughness
Topography
Wire
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Summary:SiNW (silicon nanowire) arrays consisting of 5- and 10-wires were fabricated by using an atomic force microscope—the local anodic oxidation (AFM-LAO) technique followed by wet chemical etching. Tetramethylammonium hydroxide (TMAH) and isopropyl alcohol (IPA) at various concentrations were used to etch SiNWs. The SiNWs produced were differed in dimension and surface roughness. The SiNWs were functionalized and used for the detection of deoxyribonucleic acid (DNA) dengue (DEN-1). SiNW-based biosensors show sensitive detection of dengue DNA due to certain factors. The physical properties of SiNWs, such as the number of wires, the dimensions of wires, and surface roughness, were found to influence the sensitivity of the biosensor device. The SiNW biosensor device with 10 wires, a larger surface-to-volume ratio, and a rough surface is the most sensitive device, with a 1.93 fM limit of detection (LOD).
ISSN:1996-1944
1996-1944
DOI:10.3390/ma14195716