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Impact of the RF Power on the Copper Nitride Films Deposited in a Pure Nitrogen Environment for Applications as Eco-Friendly Solar Absorber
This material can be considered to be an interesting eco-friendly choice to be used in the photovoltaic field. In this work, we present the fabrication of Cu N thin films by reactive radio-frequency (RF) magnetron sputtering at room temperature, using nitrogen as the process gas. Different RF power...
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Published in: | Materials 2023-02, Vol.16 (4), p.1508 |
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description | This material can be considered to be an interesting eco-friendly choice to be used in the photovoltaic field. In this work, we present the fabrication of Cu
N thin films by reactive radio-frequency (RF) magnetron sputtering at room temperature, using nitrogen as the process gas. Different RF power values ranged from 25 to 200 W and gas pressures of 3.5 and 5 Pa were tested to determine their impact on the film properties. The morphology and structure were exhaustively examined by Atomic Force Microscopy (AFM), Fourier Transform Infrared (FTIR) and Raman Spectroscopies and X-ray Diffraction (XRD), respectively. The AFM micrographs revealed different morphologies depending on the total pressure used, and rougher surfaces when the films were deposited at the lowest pressure; whereas FTIR and Raman spectra exhibited the characteristics bands related to the Cu-N bonds of Cu
N. Such bands became narrower as the RF power increased. XRD patterns showed the (100) plane as the preferred orientation, that changed to (111) with the RF power, revealing a worsening in structural quality. Finally, the band gap energy was estimated from transmission spectra carried out with a Perkin Elmer 1050 spectrophotometer to evaluate the suitability of Cu
N as a light absorber. The values obtained demonstrated the capability of Cu
N for solar energy conversion applications, indicating a better film performance under the sputtering conditions 5.0 Pa and RF power values ranged from 50 to 100 W. |
doi_str_mv | 10.3390/ma16041508 |
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fullrecord | <record><control><sourceid>gale_pubme</sourceid><recordid>TN_cdi_pubmedcentral_primary_oai_pubmedcentral_nih_gov_9965105</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><galeid>A743159347</galeid><sourcerecordid>A743159347</sourcerecordid><originalsourceid>FETCH-LOGICAL-c445t-a45c4df24ee3bedc2a88866def0a6513ddcebaea13ea0cb2e5653df34c861ea3</originalsourceid><addsrcrecordid>eNpdkt1uFSEQxzdGY5vaGx_AkHhjTLbCAvtxY3Jyeo42abTR3hMWZk9pWGaF3Zo-gy8t7am1ChfMwG-GGfgXxWtGTzjv6IdRs5oKJmn7rDhkXVeXrBPi-RP7oDhO6ZrmwTlrq-5lccDrljeMN4fFr7Nx0mYmOJD5Csi3LbnAnxAJhnt_jdOUvS9ujs4C2To_JnIKEyY3gyUuEE0ulgj3BO4gkE24cRHDCGEmA0aymibvjJ4dhkR0IhuD5TY6CNbfku_odUb6hLGH-Kp4MWif4PhhPSout5vL9efy_Ouns_XqvDRCyLnUQhphh0oA8B6sqXTbtnVtYaC6loxba6DXoBkHTU1fgawltwMXpq0ZaH5UfNynnZZ-zPG50qi9mqIbdbxVqJ369yS4K7XDG5UfVDIqc4J3Dwki_lggzWp0yYD3OgAuSVVNS2nT1PIOffsfeo1LDLm7TDWd7Kr8I5k62VM77UG5MGC-1-RpYXQGAwwu768awZnsuGhywPt9gImYUoThsXpG1Z0s1F9ZZPjN034f0T8i4L8BiV20lw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2779592182</pqid></control><display><type>article</type><title>Impact of the RF Power on the Copper Nitride Films Deposited in a Pure Nitrogen Environment for Applications as Eco-Friendly Solar Absorber</title><source>Open Access: PubMed Central</source><source>Publicly Available Content Database</source><source>Free Full-Text Journals in Chemistry</source><creator>Rodríguez-Tapiador, M I ; Merino, J ; Jawhari, T ; Muñoz-Rosas, A L ; Bertomeu, J ; Fernández, S</creator><creatorcontrib>Rodríguez-Tapiador, M I ; Merino, J ; Jawhari, T ; Muñoz-Rosas, A L ; Bertomeu, J ; Fernández, S</creatorcontrib><description>This material can be considered to be an interesting eco-friendly choice to be used in the photovoltaic field. In this work, we present the fabrication of Cu
N thin films by reactive radio-frequency (RF) magnetron sputtering at room temperature, using nitrogen as the process gas. Different RF power values ranged from 25 to 200 W and gas pressures of 3.5 and 5 Pa were tested to determine their impact on the film properties. The morphology and structure were exhaustively examined by Atomic Force Microscopy (AFM), Fourier Transform Infrared (FTIR) and Raman Spectroscopies and X-ray Diffraction (XRD), respectively. The AFM micrographs revealed different morphologies depending on the total pressure used, and rougher surfaces when the films were deposited at the lowest pressure; whereas FTIR and Raman spectra exhibited the characteristics bands related to the Cu-N bonds of Cu
N. Such bands became narrower as the RF power increased. XRD patterns showed the (100) plane as the preferred orientation, that changed to (111) with the RF power, revealing a worsening in structural quality. Finally, the band gap energy was estimated from transmission spectra carried out with a Perkin Elmer 1050 spectrophotometer to evaluate the suitability of Cu
N as a light absorber. The values obtained demonstrated the capability of Cu
N for solar energy conversion applications, indicating a better film performance under the sputtering conditions 5.0 Pa and RF power values ranged from 50 to 100 W.</description><identifier>ISSN: 1996-1944</identifier><identifier>EISSN: 1996-1944</identifier><identifier>DOI: 10.3390/ma16041508</identifier><identifier>PMID: 36837137</identifier><language>eng</language><publisher>Switzerland: MDPI AG</publisher><subject>Atomic force microscopy ; Copper ; Copper industry ; Crystal structure ; Energy gap ; Fourier transforms ; Infrared spectroscopy ; Magnetron sputtering ; Metals ; Molecular beam epitaxy ; Morphology ; Nitrogen ; Photomicrographs ; Photovoltaic cells ; Preferred orientation ; Radio frequency ; Raman spectra ; Room temperature ; Silicon wafers ; Solar energy ; Solar energy absorbers ; Solar energy conversion ; Spectrum analysis ; Technology application ; Thin films ; X-ray diffraction</subject><ispartof>Materials, 2023-02, Vol.16 (4), p.1508</ispartof><rights>COPYRIGHT 2023 MDPI AG</rights><rights>2023 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License.</rights><rights>2023 by the authors. 2023</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c445t-a45c4df24ee3bedc2a88866def0a6513ddcebaea13ea0cb2e5653df34c861ea3</citedby><cites>FETCH-LOGICAL-c445t-a45c4df24ee3bedc2a88866def0a6513ddcebaea13ea0cb2e5653df34c861ea3</cites><orcidid>0000-0002-5398-4766 ; 0000-0003-4264-9767 ; 0000-0003-0903-6192</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://www.proquest.com/docview/2779592182/fulltextPDF?pq-origsite=primo$$EPDF$$P50$$Gproquest$$Hfree_for_read</linktopdf><linktohtml>$$Uhttps://www.proquest.com/docview/2779592182?pq-origsite=primo$$EHTML$$P50$$Gproquest$$Hfree_for_read</linktohtml><link.rule.ids>230,314,727,780,784,885,25753,27924,27925,37012,37013,44590,53791,53793,75126</link.rule.ids><backlink>$$Uhttps://www.ncbi.nlm.nih.gov/pubmed/36837137$$D View this record in MEDLINE/PubMed$$Hfree_for_read</backlink></links><search><creatorcontrib>Rodríguez-Tapiador, M I</creatorcontrib><creatorcontrib>Merino, J</creatorcontrib><creatorcontrib>Jawhari, T</creatorcontrib><creatorcontrib>Muñoz-Rosas, A L</creatorcontrib><creatorcontrib>Bertomeu, J</creatorcontrib><creatorcontrib>Fernández, S</creatorcontrib><title>Impact of the RF Power on the Copper Nitride Films Deposited in a Pure Nitrogen Environment for Applications as Eco-Friendly Solar Absorber</title><title>Materials</title><addtitle>Materials (Basel)</addtitle><description>This material can be considered to be an interesting eco-friendly choice to be used in the photovoltaic field. In this work, we present the fabrication of Cu
N thin films by reactive radio-frequency (RF) magnetron sputtering at room temperature, using nitrogen as the process gas. Different RF power values ranged from 25 to 200 W and gas pressures of 3.5 and 5 Pa were tested to determine their impact on the film properties. The morphology and structure were exhaustively examined by Atomic Force Microscopy (AFM), Fourier Transform Infrared (FTIR) and Raman Spectroscopies and X-ray Diffraction (XRD), respectively. The AFM micrographs revealed different morphologies depending on the total pressure used, and rougher surfaces when the films were deposited at the lowest pressure; whereas FTIR and Raman spectra exhibited the characteristics bands related to the Cu-N bonds of Cu
N. Such bands became narrower as the RF power increased. XRD patterns showed the (100) plane as the preferred orientation, that changed to (111) with the RF power, revealing a worsening in structural quality. Finally, the band gap energy was estimated from transmission spectra carried out with a Perkin Elmer 1050 spectrophotometer to evaluate the suitability of Cu
N as a light absorber. The values obtained demonstrated the capability of Cu
N for solar energy conversion applications, indicating a better film performance under the sputtering conditions 5.0 Pa and RF power values ranged from 50 to 100 W.</description><subject>Atomic force microscopy</subject><subject>Copper</subject><subject>Copper industry</subject><subject>Crystal structure</subject><subject>Energy gap</subject><subject>Fourier transforms</subject><subject>Infrared spectroscopy</subject><subject>Magnetron sputtering</subject><subject>Metals</subject><subject>Molecular beam epitaxy</subject><subject>Morphology</subject><subject>Nitrogen</subject><subject>Photomicrographs</subject><subject>Photovoltaic cells</subject><subject>Preferred orientation</subject><subject>Radio frequency</subject><subject>Raman spectra</subject><subject>Room temperature</subject><subject>Silicon wafers</subject><subject>Solar energy</subject><subject>Solar energy absorbers</subject><subject>Solar energy conversion</subject><subject>Spectrum analysis</subject><subject>Technology application</subject><subject>Thin films</subject><subject>X-ray diffraction</subject><issn>1996-1944</issn><issn>1996-1944</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2023</creationdate><recordtype>article</recordtype><sourceid>PIMPY</sourceid><recordid>eNpdkt1uFSEQxzdGY5vaGx_AkHhjTLbCAvtxY3Jyeo42abTR3hMWZk9pWGaF3Zo-gy8t7am1ChfMwG-GGfgXxWtGTzjv6IdRs5oKJmn7rDhkXVeXrBPi-RP7oDhO6ZrmwTlrq-5lccDrljeMN4fFr7Nx0mYmOJD5Csi3LbnAnxAJhnt_jdOUvS9ujs4C2To_JnIKEyY3gyUuEE0ulgj3BO4gkE24cRHDCGEmA0aymibvjJ4dhkR0IhuD5TY6CNbfku_odUb6hLGH-Kp4MWif4PhhPSout5vL9efy_Ouns_XqvDRCyLnUQhphh0oA8B6sqXTbtnVtYaC6loxba6DXoBkHTU1fgawltwMXpq0ZaH5UfNynnZZ-zPG50qi9mqIbdbxVqJ369yS4K7XDG5UfVDIqc4J3Dwki_lggzWp0yYD3OgAuSVVNS2nT1PIOffsfeo1LDLm7TDWd7Kr8I5k62VM77UG5MGC-1-RpYXQGAwwu768awZnsuGhywPt9gImYUoThsXpG1Z0s1F9ZZPjN034f0T8i4L8BiV20lw</recordid><startdate>20230210</startdate><enddate>20230210</enddate><creator>Rodríguez-Tapiador, M I</creator><creator>Merino, J</creator><creator>Jawhari, T</creator><creator>Muñoz-Rosas, A L</creator><creator>Bertomeu, J</creator><creator>Fernández, S</creator><general>MDPI AG</general><general>MDPI</general><scope>NPM</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>8FD</scope><scope>8FE</scope><scope>8FG</scope><scope>ABJCF</scope><scope>ABUWG</scope><scope>AFKRA</scope><scope>AZQEC</scope><scope>BENPR</scope><scope>BGLVJ</scope><scope>CCPQU</scope><scope>D1I</scope><scope>DWQXO</scope><scope>HCIFZ</scope><scope>JG9</scope><scope>KB.</scope><scope>PDBOC</scope><scope>PIMPY</scope><scope>PQEST</scope><scope>PQQKQ</scope><scope>PQUKI</scope><scope>PRINS</scope><scope>7X8</scope><scope>5PM</scope><orcidid>https://orcid.org/0000-0002-5398-4766</orcidid><orcidid>https://orcid.org/0000-0003-4264-9767</orcidid><orcidid>https://orcid.org/0000-0003-0903-6192</orcidid></search><sort><creationdate>20230210</creationdate><title>Impact of the RF Power on the Copper Nitride Films Deposited in a Pure Nitrogen Environment for Applications as Eco-Friendly Solar Absorber</title><author>Rodríguez-Tapiador, M I ; Merino, J ; Jawhari, T ; Muñoz-Rosas, A L ; Bertomeu, J ; Fernández, S</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c445t-a45c4df24ee3bedc2a88866def0a6513ddcebaea13ea0cb2e5653df34c861ea3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2023</creationdate><topic>Atomic force microscopy</topic><topic>Copper</topic><topic>Copper industry</topic><topic>Crystal structure</topic><topic>Energy gap</topic><topic>Fourier transforms</topic><topic>Infrared spectroscopy</topic><topic>Magnetron sputtering</topic><topic>Metals</topic><topic>Molecular beam epitaxy</topic><topic>Morphology</topic><topic>Nitrogen</topic><topic>Photomicrographs</topic><topic>Photovoltaic cells</topic><topic>Preferred orientation</topic><topic>Radio frequency</topic><topic>Raman spectra</topic><topic>Room temperature</topic><topic>Silicon wafers</topic><topic>Solar energy</topic><topic>Solar energy absorbers</topic><topic>Solar energy conversion</topic><topic>Spectrum analysis</topic><topic>Technology application</topic><topic>Thin films</topic><topic>X-ray diffraction</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Rodríguez-Tapiador, M I</creatorcontrib><creatorcontrib>Merino, J</creatorcontrib><creatorcontrib>Jawhari, T</creatorcontrib><creatorcontrib>Muñoz-Rosas, A L</creatorcontrib><creatorcontrib>Bertomeu, J</creatorcontrib><creatorcontrib>Fernández, S</creatorcontrib><collection>PubMed</collection><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>Technology Research Database</collection><collection>ProQuest SciTech Collection</collection><collection>ProQuest Technology Collection</collection><collection>Materials Science & Engineering Collection</collection><collection>ProQuest Central (Alumni)</collection><collection>ProQuest Central</collection><collection>ProQuest Central Essentials</collection><collection>AUTh Library subscriptions: ProQuest Central</collection><collection>Technology Collection</collection><collection>ProQuest One Community College</collection><collection>ProQuest Materials Science Collection</collection><collection>ProQuest Central Korea</collection><collection>SciTech Premium Collection</collection><collection>Materials Research Database</collection><collection>Materials Science Database</collection><collection>Materials science collection</collection><collection>Publicly Available Content Database</collection><collection>ProQuest One Academic Eastern Edition (DO NOT USE)</collection><collection>ProQuest One Academic</collection><collection>ProQuest One Academic UKI Edition</collection><collection>ProQuest Central China</collection><collection>MEDLINE - Academic</collection><collection>PubMed Central (Full Participant titles)</collection><jtitle>Materials</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Rodríguez-Tapiador, M I</au><au>Merino, J</au><au>Jawhari, T</au><au>Muñoz-Rosas, A L</au><au>Bertomeu, J</au><au>Fernández, S</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Impact of the RF Power on the Copper Nitride Films Deposited in a Pure Nitrogen Environment for Applications as Eco-Friendly Solar Absorber</atitle><jtitle>Materials</jtitle><addtitle>Materials (Basel)</addtitle><date>2023-02-10</date><risdate>2023</risdate><volume>16</volume><issue>4</issue><spage>1508</spage><pages>1508-</pages><issn>1996-1944</issn><eissn>1996-1944</eissn><abstract>This material can be considered to be an interesting eco-friendly choice to be used in the photovoltaic field. In this work, we present the fabrication of Cu
N thin films by reactive radio-frequency (RF) magnetron sputtering at room temperature, using nitrogen as the process gas. Different RF power values ranged from 25 to 200 W and gas pressures of 3.5 and 5 Pa were tested to determine their impact on the film properties. The morphology and structure were exhaustively examined by Atomic Force Microscopy (AFM), Fourier Transform Infrared (FTIR) and Raman Spectroscopies and X-ray Diffraction (XRD), respectively. The AFM micrographs revealed different morphologies depending on the total pressure used, and rougher surfaces when the films were deposited at the lowest pressure; whereas FTIR and Raman spectra exhibited the characteristics bands related to the Cu-N bonds of Cu
N. Such bands became narrower as the RF power increased. XRD patterns showed the (100) plane as the preferred orientation, that changed to (111) with the RF power, revealing a worsening in structural quality. Finally, the band gap energy was estimated from transmission spectra carried out with a Perkin Elmer 1050 spectrophotometer to evaluate the suitability of Cu
N as a light absorber. The values obtained demonstrated the capability of Cu
N for solar energy conversion applications, indicating a better film performance under the sputtering conditions 5.0 Pa and RF power values ranged from 50 to 100 W.</abstract><cop>Switzerland</cop><pub>MDPI AG</pub><pmid>36837137</pmid><doi>10.3390/ma16041508</doi><orcidid>https://orcid.org/0000-0002-5398-4766</orcidid><orcidid>https://orcid.org/0000-0003-4264-9767</orcidid><orcidid>https://orcid.org/0000-0003-0903-6192</orcidid><oa>free_for_read</oa></addata></record> |
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subjects | Atomic force microscopy Copper Copper industry Crystal structure Energy gap Fourier transforms Infrared spectroscopy Magnetron sputtering Metals Molecular beam epitaxy Morphology Nitrogen Photomicrographs Photovoltaic cells Preferred orientation Radio frequency Raman spectra Room temperature Silicon wafers Solar energy Solar energy absorbers Solar energy conversion Spectrum analysis Technology application Thin films X-ray diffraction |
title | Impact of the RF Power on the Copper Nitride Films Deposited in a Pure Nitrogen Environment for Applications as Eco-Friendly Solar Absorber |
url | http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-27T02%3A15%3A31IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-gale_pubme&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Impact%20of%20the%20RF%20Power%20on%20the%20Copper%20Nitride%20Films%20Deposited%20in%20a%20Pure%20Nitrogen%20Environment%20for%20Applications%20as%20Eco-Friendly%20Solar%20Absorber&rft.jtitle=Materials&rft.au=Rodr%C3%ADguez-Tapiador,%20M%20I&rft.date=2023-02-10&rft.volume=16&rft.issue=4&rft.spage=1508&rft.pages=1508-&rft.issn=1996-1944&rft.eissn=1996-1944&rft_id=info:doi/10.3390/ma16041508&rft_dat=%3Cgale_pubme%3EA743159347%3C/gale_pubme%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c445t-a45c4df24ee3bedc2a88866def0a6513ddcebaea13ea0cb2e5653df34c861ea3%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_pqid=2779592182&rft_id=info:pmid/36837137&rft_galeid=A743159347&rfr_iscdi=true |