Rapid prototyping of poly(dimethoxysiloxane) dot arrays by dip-pen nanolithographyElectronic supplementary information (ESI) available: Information on the patterning of PDMS lines. See DOI: 10.1039/c0sc00420k

We report the first direct patterning of elastomeric PDMS structures by dip-pen nanolithography (DPN). This method involves the use of a cantilever tip to transfer a PDMS ink onto a silicon dioxide surface to create dot array patterns which are then cross-linked and bonded irreversibly to the substr...

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Bibliographic Details
Main Authors: Hernandez-Santana, Aaron, Irvine, Eleanore, Faulds, Karen, Graham, Duncan
Format: Article
Language:English
Online Access:Get full text
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Summary:We report the first direct patterning of elastomeric PDMS structures by dip-pen nanolithography (DPN). This method involves the use of a cantilever tip to transfer a PDMS ink onto a silicon dioxide surface to create dot array patterns which are then cross-linked and bonded irreversibly to the substrate. The chemical composition of the PDMS structures deposited by DPN was characterised by Raman microspectroscopy to provide an insight into the ink transfer process. This technique offers a significant advance in the ability to rapidly and easily produce programmable surface features from a widely used polymer for use in a variety of applications. We present a direct-write approach for patterning poly(dimethoxysiloxane) (PDMS) structures using dip-pen nanolithography (DPN).
ISSN:2041-6520
2041-6539
DOI:10.1039/c0sc00420k