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Zinc complex based photoinitiating systems for acrylate polymerization under air; in situ formation of Zn-based fillers and composites
[ N , N ′-Bis(salicylidene)-1,2-phenylenediamine]zinc( ii ) (ZnC) exhibits unexpected properties as a photoinitiator or additive for both free-radical photopolymerization reactions and in situ formation of Zn-based fillers under light activation and aerated conditions. The ZnC/2,2-dimethoxy-2-phenyl...
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Published in: | Polymer chemistry 2014-11, Vol.5 (22), p.6569-6576 |
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Main Authors: | , , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | [
N
,
N
′-Bis(salicylidene)-1,2-phenylenediamine]zinc(
ii
) (ZnC) exhibits unexpected properties as a photoinitiator or additive for both free-radical photopolymerization reactions and
in situ
formation of Zn-based fillers under light activation and aerated conditions. The ZnC/2,2-dimethoxy-2-phenylacetophenone (DMPA) and ZnC/
N
-methyldiethanolamine (MDEA) couples are characterized by remarkable properties: (i) a photoinitiating efficiency for the radical polymerization of an acrylate matrix under air higher than that of a reference Type I photoinitiator such as DMPA (final conversion of ∼30-45%
vs.
15%) and therefore a good ability to overcome the oxygen inhibition effect and (ii) a never reported
in situ
formation of Zn-based fillers (100 μm thick sticks) or composites. The photochemical properties of the ZnC are investigated by fluorescence and UV-visible spectroscopy and Electron Spin Resonance (ESR). The photodecomposition of ZnC under air is governed by either an addition of peroxyl radicals onto ZnC when associated with DMPA, or a H-abstraction mechanism when combined with MDEA. When using a ZnC/MDEA/silver salt photoinitiating system, a highly efficient polymerization of the acrylate matrix under air and a concomitant
in situ
production of Ag(0) NPs are observed.
Photoinitiating systems based on a zinc complex are used for avoiding the oxygen inhibition during the photopolymerization of acrylate and the generation of Zn fillers and Ag NPs. |
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ISSN: | 1759-9954 1759-9962 |
DOI: | 10.1039/c4py00716f |