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Electrochemical fabrication of Ni(OH)2/Ni 3D porous composite films as integrated capacitive electrodes
Ni(OH) 2 coated on Ni porous films are facilely fabricated by anode oxidation of 3D hierarchical porous Ni films which are prepared through a hydrogen bubble template electro-deposition method. The highly porous nickel films function as effective 3D conductive network current collectors and scaffold...
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Published in: | RSC advances 2015, Vol.5 (17), p.12931-12936 |
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Main Authors: | , , , , , , , , |
Format: | Article |
Language: | English |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Ni(OH)
2
coated on Ni porous films are facilely fabricated by anode oxidation of 3D hierarchical porous Ni films which are prepared through a hydrogen bubble template electro-deposition method. The highly porous nickel films function as effective 3D conductive network current collectors and scaffolds to
in situ
form a thin layer of Ni(OH)
2
active material. The electrochemical capacitive performances are investigated by cyclic voltammetry (CV) and the galvanostatic charge-discharge technique in 6 M KOH electrolyte. The 3D porous Ni(OH)
2
/Ni integrated electrodes demonstrate a much higher specific capacity of 828 mF cm
−2
than 126 mF cm
−2
for the smooth Ni(OH)
2
/Ni electrode at a current density of 10 mA cm
−2
. The 3D porous Ni(OH)
2
/Ni integrated electrodes also display a good capacity retention of 95% after 1000 cycles. The superior capacitive properties of 3D porous Ni(OH)
2
/Ni electrodes might result from the thin layer Ni(OH)
2
active materials
in situ
formed on the highly 3D porous Ni metallic current collector with large surface area, low contact resistance between Ni(OH)
2
active material and Ni current collector, and fast electron/ion conduction.
Ni(OH)
2
coated on Ni porous films are facilely fabricated by anode oxidation of 3D hierarchical porous Ni films which are prepared through a hydrogen bubble template electro-deposition method. |
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ISSN: | 2046-2069 2046-2069 |
DOI: | 10.1039/c4ra15092a |