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High-performance HS gas sensor utilizing MXene/MoS heterostructure synthesized the Langmuir-Blodgett technique and chemical vapor deposition
In this study, we developed an H 2 S gas sensor based on a MXene/MoS 2 heterostructure, using the Langmuir-Blodgett (LB) technique and chemical vapor deposition (CVD). Ti 3 C 2 T x MXene nanosheets were uniformly transferred onto SiO 2 /Si substrates via the LB technique, achieving near-complete cov...
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Published in: | RSC advances 2024-11, Vol.14 (51), p.37781-37787 |
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Main Authors: | , , , , , , , , |
Format: | Article |
Language: | |
Online Access: | Get full text |
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Summary: | In this study, we developed an H
2
S gas sensor based on a MXene/MoS
2
heterostructure, using the Langmuir-Blodgett (LB) technique and chemical vapor deposition (CVD). Ti
3
C
2
T
x
MXene nanosheets were uniformly transferred onto SiO
2
/Si substrates
via
the LB technique, achieving near-complete coverage. Subsequently, flower-like MoS
2
was grown on the MXene-coated substrate through CVD, with vertical growth observed on the MXene layers. Our hybrid sensors exhibited a significant enhancement in gas response, with the MXene/MoS
2
heterostructure showing a response of 0.5 to H
2
S - approximately five times greater than that of pristine MXene. This improvement is attributed to the formation of a heterojunction, which increases electron mobility and reduces the depletion layer, enabling more efficient gas detection. Furthermore, the sensor demonstrated excellent selectivity for H
2
S over other gases, including H
2
, NO
2
, NH
3
, NO, and VOCs. The combination of the LB technique and CVD not only enhances gas sensor performance but also offers a promising strategy for synthesizing materials for various electrochemical applications.
An H
2
S gas sensor was developed using an MXene/MoS
2
heterostructure, fabricated through Langmuir-Blodgett and CVD. The gas sensor showed a 5-fold enhancement in gas response for H
2
S, demonstrating a new approach for advanced electronic applications. |
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ISSN: | 2046-2069 |
DOI: | 10.1039/d4ra07555b |