Optimization of high B sat FeCo films for write pole applications

FeCo films and their lamination with ultrathin NiFe layers down to 5 Å were deposited using dc magnetron sputtering techniques. Soft magnetic FeCo films were obtained at an optimal target power of 500 W and an optimal deposition pressure of 2 mTorr with high saturation flux density, B sat > 2.4 T...

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Bibliographic Details
Published in:Journal of applied physics 2005-05, Vol.97 (10), p.10F908-10F908-3
Main Authors: Mao, Ming, Schneider, Thomas, Bubber, Randhir, Kools, Jacques, Liu, Xubo, Altounian, Zaven, Lee, Chih-Ling, Devasahayam, Adrian, Rook, Katrina
Format: Article
Language:English
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Summary:FeCo films and their lamination with ultrathin NiFe layers down to 5 Å were deposited using dc magnetron sputtering techniques. Soft magnetic FeCo films were obtained at an optimal target power of 500 W and an optimal deposition pressure of 2 mTorr with high saturation flux density, B sat > 2.4 T , and low easy-axis coercivity, H ce ⩽ 15 Oe , and hard-axis coercivity, H ch ⩽ 3 Oe , at a film thickness of 2000 Å . While the magnetostriction remains at ∼ 4 × 10 − 6 the stress was further optimized by applying substrate bias at a controlled level ⩽ 50 V without sacrificing film magnetic softness.
ISSN:0021-8979
1089-7550
DOI:10.1063/1.1853951