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Interlayer coupling in ferromagnetic epitaxial Fe 3 Si ∕ Fe Si 2 superlattices
Ferromagnetic epitaxial B 2 -type Fe 3 Si ∕ Fe Si 2 superlattices were prepared on Si(111) at room temperature by facing target direct-current sputtering. The bilinear and biquadratic coupling constants J 1 and J 2 of the antiferromagnetically coupled superlattice were comparable to those of the sim...
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Published in: | Applied physics letters 2006-12, Vol.89 (25), p.253110-253110-3 |
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container_end_page | 253110-3 |
container_issue | 25 |
container_start_page | 253110 |
container_title | Applied physics letters |
container_volume | 89 |
creator | Yoshitake, T. Ogawa, T. Nakagauchi, D. Hara, D. Itakura, M. Kuwano, N. Tomokiyo, Y. Takeda, K. Kajiwara, T. Ohashi, M. Oomi, G. Nagayama, K. |
description | Ferromagnetic epitaxial
B
2
-type
Fe
3
Si
∕
Fe
Si
2
superlattices were prepared on Si(111) at room temperature by facing target direct-current sputtering. The bilinear and biquadratic coupling constants
J
1
and
J
2
of the antiferromagnetically coupled superlattice were comparable to those of the similar superlattices using Fe layers although the saturation magnetization of
Fe
3
Si
is approximately half as large as that of Fe. The authors believe that this is due to the formation of a well-ordered quantum well in the spacers, which is mainly caused by the regular accumulation of highly oriented
Fe
3
Si
layers. |
doi_str_mv | 10.1063/1.2410222 |
format | article |
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B
2
-type
Fe
3
Si
∕
Fe
Si
2
superlattices were prepared on Si(111) at room temperature by facing target direct-current sputtering. The bilinear and biquadratic coupling constants
J
1
and
J
2
of the antiferromagnetically coupled superlattice were comparable to those of the similar superlattices using Fe layers although the saturation magnetization of
Fe
3
Si
is approximately half as large as that of Fe. The authors believe that this is due to the formation of a well-ordered quantum well in the spacers, which is mainly caused by the regular accumulation of highly oriented
Fe
3
Si
layers.</description><identifier>ISSN: 0003-6951</identifier><identifier>EISSN: 1077-3118</identifier><identifier>DOI: 10.1063/1.2410222</identifier><identifier>CODEN: APPLAB</identifier><publisher>American Institute of Physics</publisher><ispartof>Applied physics letters, 2006-12, Vol.89 (25), p.253110-253110-3</ispartof><rights>2006 American Institute of Physics</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><cites>FETCH-scitation_primary_10_1063_1_2410222Interlayer_coupling3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://pubs.aip.org/apl/article-lookup/doi/10.1063/1.2410222$$EHTML$$P50$$Gscitation$$H</linktohtml><link.rule.ids>314,777,779,781,792,27905,27906,76132</link.rule.ids></links><search><creatorcontrib>Yoshitake, T.</creatorcontrib><creatorcontrib>Ogawa, T.</creatorcontrib><creatorcontrib>Nakagauchi, D.</creatorcontrib><creatorcontrib>Hara, D.</creatorcontrib><creatorcontrib>Itakura, M.</creatorcontrib><creatorcontrib>Kuwano, N.</creatorcontrib><creatorcontrib>Tomokiyo, Y.</creatorcontrib><creatorcontrib>Takeda, K.</creatorcontrib><creatorcontrib>Kajiwara, T.</creatorcontrib><creatorcontrib>Ohashi, M.</creatorcontrib><creatorcontrib>Oomi, G.</creatorcontrib><creatorcontrib>Nagayama, K.</creatorcontrib><title>Interlayer coupling in ferromagnetic epitaxial Fe 3 Si ∕ Fe Si 2 superlattices</title><title>Applied physics letters</title><description>Ferromagnetic epitaxial
B
2
-type
Fe
3
Si
∕
Fe
Si
2
superlattices were prepared on Si(111) at room temperature by facing target direct-current sputtering. The bilinear and biquadratic coupling constants
J
1
and
J
2
of the antiferromagnetically coupled superlattice were comparable to those of the similar superlattices using Fe layers although the saturation magnetization of
Fe
3
Si
is approximately half as large as that of Fe. The authors believe that this is due to the formation of a well-ordered quantum well in the spacers, which is mainly caused by the regular accumulation of highly oriented
Fe
3
Si
layers.</description><issn>0003-6951</issn><issn>1077-3118</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2006</creationdate><recordtype>article</recordtype><sourceid/><recordid>eNqljk0KwjAUhIMoWH8W3uBdoJqX2FYXrkTRnaD7EEpaIm1akhT0Bl7AC3oSW1A8gKuZgZnhI2SGdI405gucsyVSxliPBEiTJOSIqz4JKKU8jNcRDsnIuWsbI8Z5QE5H45Ut5F1ZSKumLrTJQRvIlLVVKXOjvE5B1drLm5YF7BVwOGt4PZ6dbx0D19TdhW-byk3IIJOFU9OPjslmv7tsD6FL2w-vKyNqq0tp7wKp6JgFig_zj0V8Wfi_-zcrxVaz</recordid><startdate>20061220</startdate><enddate>20061220</enddate><creator>Yoshitake, T.</creator><creator>Ogawa, T.</creator><creator>Nakagauchi, D.</creator><creator>Hara, D.</creator><creator>Itakura, M.</creator><creator>Kuwano, N.</creator><creator>Tomokiyo, Y.</creator><creator>Takeda, K.</creator><creator>Kajiwara, T.</creator><creator>Ohashi, M.</creator><creator>Oomi, G.</creator><creator>Nagayama, K.</creator><general>American Institute of Physics</general><scope/></search><sort><creationdate>20061220</creationdate><title>Interlayer coupling in ferromagnetic epitaxial Fe 3 Si ∕ Fe Si 2 superlattices</title><author>Yoshitake, T. ; Ogawa, T. ; Nakagauchi, D. ; Hara, D. ; Itakura, M. ; Kuwano, N. ; Tomokiyo, Y. ; Takeda, K. ; Kajiwara, T. ; Ohashi, M. ; Oomi, G. ; Nagayama, K.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-scitation_primary_10_1063_1_2410222Interlayer_coupling3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><creationdate>2006</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Yoshitake, T.</creatorcontrib><creatorcontrib>Ogawa, T.</creatorcontrib><creatorcontrib>Nakagauchi, D.</creatorcontrib><creatorcontrib>Hara, D.</creatorcontrib><creatorcontrib>Itakura, M.</creatorcontrib><creatorcontrib>Kuwano, N.</creatorcontrib><creatorcontrib>Tomokiyo, Y.</creatorcontrib><creatorcontrib>Takeda, K.</creatorcontrib><creatorcontrib>Kajiwara, T.</creatorcontrib><creatorcontrib>Ohashi, M.</creatorcontrib><creatorcontrib>Oomi, G.</creatorcontrib><creatorcontrib>Nagayama, K.</creatorcontrib><jtitle>Applied physics letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Yoshitake, T.</au><au>Ogawa, T.</au><au>Nakagauchi, D.</au><au>Hara, D.</au><au>Itakura, M.</au><au>Kuwano, N.</au><au>Tomokiyo, Y.</au><au>Takeda, K.</au><au>Kajiwara, T.</au><au>Ohashi, M.</au><au>Oomi, G.</au><au>Nagayama, K.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Interlayer coupling in ferromagnetic epitaxial Fe 3 Si ∕ Fe Si 2 superlattices</atitle><jtitle>Applied physics letters</jtitle><date>2006-12-20</date><risdate>2006</risdate><volume>89</volume><issue>25</issue><spage>253110</spage><epage>253110-3</epage><pages>253110-253110-3</pages><issn>0003-6951</issn><eissn>1077-3118</eissn><coden>APPLAB</coden><abstract>Ferromagnetic epitaxial
B
2
-type
Fe
3
Si
∕
Fe
Si
2
superlattices were prepared on Si(111) at room temperature by facing target direct-current sputtering. The bilinear and biquadratic coupling constants
J
1
and
J
2
of the antiferromagnetically coupled superlattice were comparable to those of the similar superlattices using Fe layers although the saturation magnetization of
Fe
3
Si
is approximately half as large as that of Fe. The authors believe that this is due to the formation of a well-ordered quantum well in the spacers, which is mainly caused by the regular accumulation of highly oriented
Fe
3
Si
layers.</abstract><pub>American Institute of Physics</pub><doi>10.1063/1.2410222</doi></addata></record> |
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recordid | cdi_scitation_primary_10_1063_1_2410222Interlayer_coupling |
source | American Institute of Physics:Jisc Collections:Transitional Journals Agreement 2021-23 (Reading list); AIP Journals (American Institute of Physics) |
title | Interlayer coupling in ferromagnetic epitaxial Fe 3 Si ∕ Fe Si 2 superlattices |
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