Plasma power measurement and hysteresis in the E - H transitionof a rf inductively coupled plasma system

An experimental investigation of the argon plasma behavior near the E - H transition in an inductively coupled Gaseous Electronics Conference reference cell is reported. Electron density and temperature, ion density, argon metastable density, and optical emission measurements have been made as funct...

Full description

Saved in:
Bibliographic Details
Published in:Applied physics letters 2008-02, Vol.92 (6), p.061504-061504-3
Main Authors: Daltrini, A. M., Moshkalev, S. A., Morgan, T. J., Piejak, R. B., Graham, W. G.
Format: Article
Language:
Citations: Items that this one cites
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:An experimental investigation of the argon plasma behavior near the E - H transition in an inductively coupled Gaseous Electronics Conference reference cell is reported. Electron density and temperature, ion density, argon metastable density, and optical emission measurements have been made as function of input power and gas pressure. When plotted versus plasma power, applied power corrected for coil and hardware losses, no hysteresis is observed in the measured plasma parameter dependence at the E - H mode transition. This suggests that hysteresis in the E - H mode transition is due to ignoring inherent power loss, primarily in the matching system.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.2844885