Combined dry plasma etching and online metrology for manufacturing highly focusing x-ray mirrors

A new figuring station was designed and installed at the ESRF beamline BM05. It allows the figuring of mirrors within an iterative process combining the advantage of online metrology with dry etching. The complete process takes place under a vacuum environment to minimize surface contamination while...

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Bibliographic Details
Main Authors: Berujon, S., Ziegler, E., da Cunha, S., Bonneau, F., Baker, R., Clement, J.-M., Perez, M., Thuaudet, S., Malandrino, G., Vivo, A., Lantelme, B., Barrett, R., Susini, J.
Format: Conference Proceeding
Language:English
Subjects:
DESIGN
ERRORS
ETCHING
EUROPEAN SYNCHROTRON RADIATION FACILITY
FOCUSING
INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY
ITERATIVE METHODS
METROLOGY
MIRRORS
PLASMA
ROUGHNESS
SURFACE CONTAMINATION
SURFACES
WAVELENGTHS
X RADIATION
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Summary:A new figuring station was designed and installed at the ESRF beamline BM05. It allows the figuring of mirrors within an iterative process combining the advantage of online metrology with dry etching. The complete process takes place under a vacuum environment to minimize surface contamination while non-contact surfacing tools open up the possibility of performing at-wavelength metrology and eliminating placement errors. The aim is to produce mirrors whose slopes do not deviate from the stigmatic profile by more than 0.1 µrad rms while keeping surface roughness in the acceptable limit of 0.1-0.2 nm rms. The desired elliptical mirror surface shape can be achieved in a few iterations in about a one day time span. This paper describes some of the important aspects of the process regarding both the online metrology and the etching process.
ISSN:0094-243X
1551-7616
DOI:10.1063/1.4952873