Plasma-etching of 2D-poled glasses: A route to dry lithography

The basis of a lithographic technique for producing glassy structures of diffractive optics, integrated optics, microfluidics, plasmonics, etc., is presented. The technique is based on the integration of two “dry” procedures: (1) glass polarization with structured (with relief surface) anodic electr...

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Bibliographic Details
Published in:Applied physics letters 2017-09, Vol.111 (11)
Main Authors: Alexandrov, S. E., Lipovskii, A. A., Osipov, A. A., Reduto, I. V., Tagantsev, D. K.
Format: Article
Language:English
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Summary:The basis of a lithographic technique for producing glassy structures of diffractive optics, integrated optics, microfluidics, plasmonics, etc., is presented. The technique is based on the integration of two “dry” procedures: (1) glass polarization with structured (with relief surface) anodic electrode and (2) plasma-chemical etching of the poled glass. A pilot relief structure (that is, relief pattern 0.5 μm in depth) on the glass surface has been produced with the proposed technique.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.4994082