Physico-chemical induced modification of seed germination and early development in artichoke (Cynara scolymus L.) using low energy plasma technology

• Published in: Physics of plasmas 2018-01, Vol.25 (1)
• Main Authors: Hosseini, Seyed Iman, Mohsenimehr, Soad, Hadian, Javad, Ghorbanpour, Mansour, Shokri, Babak
• Format: Article
• Language: English
• Subjects: Catalase; Enzyme activity; Germination; Low pressure; Nitrogen plasma; Organic chemistry; Peroxidase; Physical properties; Plant growth; Plasma; Plasma physics; Radio frequency; Seeds; Weight
• ISSN: 1070-664X; 1089-7674
• DOI: 10.1063/1.5016037

In this study, low pressure non-thermal radiofrequency nitrogen plasma at very low power has been used to treat the artichoke seeds on the powered cathode for the first time. The influence of treatment time on the surface physical properties, germination rate, seedling growth, and enzyme activity of the seeds has been investigated. Results showed that plasma treatment considerably improved the germination rate and seedling growth. The root length grew by 28.5% and 50% and root dry weight increased by 13% and 53%, respectively, for 10 and 15 min of treatment. The same trend has been found for the shoot growth parameters although the greater stimulatory efficacy on root has been obtained. The nitrogen plasma treatment substantially made the seeds' surface hydrophilic which leads to 36.9% improvement in seed's water uptake at 15 min of treatment. Our study showed the activity of peroxidase and catalase enzymes slightly increased after the plasma treatment.