Selective electric field assisted dissolution as a technique for micro and nano structuring of metal thin films

A technique for patterning compact thin metal layers is presented. The technique is based on a successive application of well known, cost-effective, and simple methods of glass poling and electric field assisted dissolution. A microstructure from the patterned anode was copied onto a thin silver lay...

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Bibliographic Details
Published in:Applied physics letters 2018-10, Vol.113 (18)
Main Authors: Janicki, V., Fabijanić, I., Okorn, B., Dubček, P., Sancho-Parramon, J.
Format: Article
Language:English
Subjects:
Anodic dissolution
Applied physics
Deoxidizing
Dissolution
Electric fields
Glass substrates
Metamaterials
Silver
Thin films
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Summary:A technique for patterning compact thin metal layers is presented. The technique is based on a successive application of well known, cost-effective, and simple methods of glass poling and electric field assisted dissolution. A microstructure from the patterned anode was copied onto a thin silver layer on a glass substrate. It is demonstrated that electric field assisted dissolution can be used for selective dissolution of compact metal layers. Nanostructuring of compact metal layers is interesting as it can be used in the production of metamaterials, metasurfaces, and optical circuits. The proposed two-step technique does not involve expensive equipment, and the duration of the structuring process is independent of the size of the required structured surface.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.5042037