Compact H+ ECR ion source with pulse gas valve

Compact H+ ECR Ion Source using permanent magnets is under development. A pulsed gas injection system achieved by a fast piezo gas valve can reduce the gas load to a vacuum evacuation system. This feature is suitable when the ion source is closely located to an RFQ. Use of permanent magnets reduces...

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Bibliographic Details
Main Authors: Iwashita, Y., Miyawaki, E., Takeuchi, Y., Tongu, H.
Format: Conference Proceeding
Language:English
Subjects:
Evacuation systems
Gas injection
Gas valves
Permanent magnets
Online Access:Get full text
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Summary:Compact H+ ECR Ion Source using permanent magnets is under development. A pulsed gas injection system achieved by a fast piezo gas valve can reduce the gas load to a vacuum evacuation system. This feature is suitable when the ion source is closely located to an RFQ. Use of permanent magnets reduces the size.
ISSN:0094-243X
1551-7616
DOI:10.1063/1.5053272