Effect of the flow rate of O2 on SnO2 thin film properties

The structural properties which include (XRD-diffraction and AFM) and optical properties of SnO2 thin films prepared by atmospheric pressure chemical vapor deposition (APCVD) at different oxygen flow rate were studied. The results show that the best conditions for prepare SnO2 thin films with high q...

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Main Authors: Hussein, Orass Abdulhadi, Abdullah, Omar Fadhil
Format: Conference Proceeding
Language:English
Subjects:
Chemical vapor deposition
Flow velocity
Optical properties
Thin films
Tin dioxide
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Abdullah, Omar Fadhil
description The structural properties which include (XRD-diffraction and AFM) and optical properties of SnO2 thin films prepared by atmospheric pressure chemical vapor deposition (APCVD) at different oxygen flow rate were studied. The results show that the best conditions for prepare SnO2 thin films with high quality (structure and optical properties) were at flow rate 1.5 l/min for APCVD method.
doi_str_mv 10.1063/5.0121157
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source American Institute of Physics:Jisc Collections:Transitional Journals Agreement 2021-23 (Reading list)
subjects Chemical vapor deposition
Flow velocity
Optical properties
Thin films
Tin dioxide
title Effect of the flow rate of O2 on SnO2 thin film properties
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