Problems concerning the demolding process of nano imprint lithography

Nanoimprint lithography is one of the most promising technologies for nanofabrication as it can create nano-and micro-scale structures and devices in a cost effective manner, and combines the speed of optical lithography with the resolution of electron beam lithography. However, it suffers from trib...

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Bibliographic Details
Main Authors: Škriniarová, Jaroslava, Andok, Robert, Kadlečíková, Magdaléna, Nevřela, Juraj
Format: Conference Proceeding
Language:English
Subjects:
Defects
Electron beam lithography
Molds
Nanofabrication
Nanolithography
Tribology
Online Access:Get full text
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Summary:Nanoimprint lithography is one of the most promising technologies for nanofabrication as it can create nano-and micro-scale structures and devices in a cost effective manner, and combines the speed of optical lithography with the resolution of electron beam lithography. However, it suffers from tribological drawback in that the mold must make the physical contact with the resist to transfer patterns. The adhesion and friction forces generated between the mold and resist can generate defects. To reduce these defects it is very important to know their origin.
ISSN:0094-243X
1551-7616
DOI:10.1063/5.0136329