Direct-write projection lithography of quantum dot micropillar single photon sources

We have developed a process to mass-produce quantum dot micropillar cavities using direct-write lithography. This technique allows us to achieve mass patterning of high-aspect ratio pillars with vertical, smooth sidewalls maintaining a high quality factor for diameters below 2.0 μm. Encapsulating th...

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Bibliographic Details
Published in:Applied physics letters 2023-08, Vol.123 (9)
Main Authors: Androvitsaneas, Petros, Clark, Rachel N., Jordan, Matthew, Alvarez Perez, Miguel, Peach, Tomas, Thomas, Stuart, Shabbir, Saleem, Sobiesierski, Angela D., Trapalis, Aristotelis, Farrer, Ian A., Langbein, Wolfgang W., Bennett, Anthony J.
Format: Article
Language:English
Subjects:
Applied physics
Aspect ratio
Holes
Lithography
Optical properties
Oxidation
Photons
Quantum dots
Tantalum
Tantalum oxides
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Summary:We have developed a process to mass-produce quantum dot micropillar cavities using direct-write lithography. This technique allows us to achieve mass patterning of high-aspect ratio pillars with vertical, smooth sidewalls maintaining a high quality factor for diameters below 2.0 μm. Encapsulating the cavities in a thin layer of oxide (Ta2O5) prevents oxidation in the atmosphere, preserving the optical properties of the cavity over months of ambient exposure. We confirm that single dots in the cavities can be deterministically excited to create high-purity indistinguishable single photons with interference visibility ( 0.941   ±   0.008 ).
ISSN:0003-6951
1077-3118
DOI:10.1063/5.0155968