The E × B magnetized plasma device (EMPD)

A plasma device has been created to study dynamic plasma coupling in an E × B-drifting magnetized plasma. The E × B magnetized plasma device is a 1.2 m diameter by 2 m long cylindrical chamber with two sets of Helmholtz coils in a mirror configuration. A steady-state axial hollow cathode source inje...

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Bibliographic Details
Published in:Review of scientific instruments 2024-09, Vol.95 (9)
Main Authors: Hooper, Charles T., Smith, Jenny R., Brewer, Trenton R., Heinrich, Jonathon R., Reid, Remington, Cooke, David L.
Format: Article
Language:English
Subjects:
Coupling
Cylindrical chambers
Cylindrical plasmas
Electric contacts
Electric field strength
Hollow cathodes
Plasma
Plasma density
Plasma jets
Rotation
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Summary:A plasma device has been created to study dynamic plasma coupling in an E × B-drifting magnetized plasma. The E × B magnetized plasma device is a 1.2 m diameter by 2 m long cylindrical chamber with two sets of Helmholtz coils in a mirror configuration. A steady-state axial hollow cathode source injects a plasma discharge in electrical contact with a floating conductor at a range that forms a unique axisymmetric equipotential surface or Virtual Cathode Lightsaber (VCL). The VCL generates two plasma populations streaming relative to one another providing a suitable environment for the investigation of dynamic plasma coupling. The plasma density, radial electric field, and plasma rotational velocity outside the VCL are shown to be influenced by the current–voltage relationship of the cathode and applied magnetic field strength. A basic characterization of the device and plasma environment is presented with an emphasis on diagnostics systems and the analytical techniques utilized.
ISSN:0034-6748
1089-7623
1089-7623
DOI:10.1063/5.0188913