Challenges and solutions in RF sputtering of superconducting Nb for nanostructuring processes

The growing interest in hybrid devices that combine two-dimensional materials with a superconductor presents new challenges in material deposition. In this study, we demonstrate that achieving excellent superconducting properties by RF (radio frequency) sputtering does not require access to a high-e...

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Bibliographic Details
Published in:Journal of applied physics 2024-11, Vol.136 (20)
Main Authors: Strenzke, Vincent, Weber, Annika, Heydolph, Peer, Moch, Isa, González Díaz-Palacio, Isabel, Hillert, Wolfgang, Zierold, Robert, Tiemann, Lars, Blick, Robert H.
Format: Article
Language:English
Subjects:
Argon
Deposition
Film thickness
Liquid nitrogen
Nanostructure
Niobium
Parameters
Radio frequency
Sputtering
Superconductivity
Thin films
Two dimensional materials
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Summary:The growing interest in hybrid devices that combine two-dimensional materials with a superconductor presents new challenges in material deposition. In this study, we demonstrate that achieving excellent superconducting properties by RF (radio frequency) sputtering does not require access to a high-end system but rather depends on the precise control of sputtering parameters and the selection of an appropriate lithographic process. We highlight the challenges and present practical solutions to deposit high-quality niobium thin films for the lithographic production of superconducting hybrid nanostructures. The influence of various deposition parameters, such as power, argon pressure, and film thickness, on the resultant superconducting characteristics can already be deduced at liquid nitrogen temperatures. Furthermore, niobium films tend to degrade when a PMMA [poly(methylmethacrylate)] resist is employed in the fabrication of superconducting nanostructures. We propose alternative and simple strategies to address this issue, which ultimately result in the restoration of the thin-film quality.
ISSN:0021-8979
1089-7550
DOI:10.1063/5.0239203