Loading…
Scanning probe metrology in the presence of surface charge
Surface charge on insulating samples can be a significant source of error for scanning probe microscopes. We have found that it is possible to operate a scanning force microscope in a manner that makes it relatively immune to charge-induced forces while still allowing the probe tip to nondestructive...
Saved in:
Published in: | Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 2000-11, Vol.18 (6), p.3264-3267 |
---|---|
Main Authors: | , , , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
cited_by | cdi_FETCH-LOGICAL-c329t-1b631a1a4f5ea3c60030e31a8dfed17f379121e9d0d31e658c0a4700797cfeba3 |
---|---|
cites | cdi_FETCH-LOGICAL-c329t-1b631a1a4f5ea3c60030e31a8dfed17f379121e9d0d31e658c0a4700797cfeba3 |
container_end_page | 3267 |
container_issue | 6 |
container_start_page | 3264 |
container_title | Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures |
container_volume | 18 |
creator | Griffith, J. E. Kneedler, E. M. Ningen, S. Berghaus, A. Bryson, C. E. Pau, S. Houge, E. Shofner, T. |
description | Surface charge on insulating samples can be a significant source of error for scanning probe microscopes. We have found that it is possible to operate a scanning force microscope in a manner that makes it relatively immune to charge-induced forces while still allowing the probe tip to nondestructively follow the surface topography. The need to maintain close charge balance on the sample is thus obviated. We have used this strategy to perform critical dimension measurements on optical photomasks with the Surface/Interface Stylus NanoProfilometer. This instrument incorporates a servoed force-balance sensor. Surface topography is determined by touching the surface with contact forces between 0.1 and 1 μN. |
doi_str_mv | 10.1116/1.1313586 |
format | article |
fullrecord | <record><control><sourceid>proquest_scita</sourceid><recordid>TN_cdi_scitation_primary_10_1116_1_1313586</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>745944077</sourcerecordid><originalsourceid>FETCH-LOGICAL-c329t-1b631a1a4f5ea3c60030e31a8dfed17f379121e9d0d31e658c0a4700797cfeba3</originalsourceid><addsrcrecordid>eNp90E1LAzEQBuAgCtbqwX-wN1FYndlskl1vUvyCggcVvIU0O2lXtklNtkL_vSstehA8zTA8vAwvY6cIl4gor_ASOXJRyT02QlFAXgmp9tkIFC_zAvHtkB2l9A4AUnA-YtfP1njf-nm2imFG2ZL6GLow32Stz_oFDWdK5C1lwWVpHZ0ZVrswcU7H7MCZLtHJbo7Z693ty-Qhnz7dP05uprnlRd3nOJMcDZrSCTLcSgAONFyqxlGDynFVY4FUN9BwJCkqC6ZUAKpW1tHM8DE72-YOH36sKfV62SZLXWc8hXXSqhR1WYJSgzzfShtDSpGcXsV2aeJGI-jvejTqXT2DvdjaZNve9G3wP_gzxF-oV437D_9N_gLKvnKg</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>745944077</pqid></control><display><type>article</type><title>Scanning probe metrology in the presence of surface charge</title><source>American Institute of Physics:Jisc Collections:Transitional Journals Agreement 2021-23 (Reading list)</source><creator>Griffith, J. E. ; Kneedler, E. M. ; Ningen, S. ; Berghaus, A. ; Bryson, C. E. ; Pau, S. ; Houge, E. ; Shofner, T.</creator><creatorcontrib>Griffith, J. E. ; Kneedler, E. M. ; Ningen, S. ; Berghaus, A. ; Bryson, C. E. ; Pau, S. ; Houge, E. ; Shofner, T.</creatorcontrib><description>Surface charge on insulating samples can be a significant source of error for scanning probe microscopes. We have found that it is possible to operate a scanning force microscope in a manner that makes it relatively immune to charge-induced forces while still allowing the probe tip to nondestructively follow the surface topography. The need to maintain close charge balance on the sample is thus obviated. We have used this strategy to perform critical dimension measurements on optical photomasks with the Surface/Interface Stylus NanoProfilometer. This instrument incorporates a servoed force-balance sensor. Surface topography is determined by touching the surface with contact forces between 0.1 and 1 μN.</description><identifier>ISSN: 0734-211X</identifier><identifier>ISSN: 1071-1023</identifier><identifier>EISSN: 1520-8567</identifier><identifier>DOI: 10.1116/1.1313586</identifier><identifier>CODEN: JVTBD9</identifier><language>eng</language><subject>Atomic force microscopy ; Electric charge ; Force measurement ; Measurement errors ; Nondestructive examination ; Probes ; Sensors</subject><ispartof>Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2000-11, Vol.18 (6), p.3264-3267</ispartof><rights>American Vacuum Society</rights><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c329t-1b631a1a4f5ea3c60030e31a8dfed17f379121e9d0d31e658c0a4700797cfeba3</citedby><cites>FETCH-LOGICAL-c329t-1b631a1a4f5ea3c60030e31a8dfed17f379121e9d0d31e658c0a4700797cfeba3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>309,310,314,780,784,789,790,23930,23931,25140,27924,27925</link.rule.ids></links><search><creatorcontrib>Griffith, J. E.</creatorcontrib><creatorcontrib>Kneedler, E. M.</creatorcontrib><creatorcontrib>Ningen, S.</creatorcontrib><creatorcontrib>Berghaus, A.</creatorcontrib><creatorcontrib>Bryson, C. E.</creatorcontrib><creatorcontrib>Pau, S.</creatorcontrib><creatorcontrib>Houge, E.</creatorcontrib><creatorcontrib>Shofner, T.</creatorcontrib><title>Scanning probe metrology in the presence of surface charge</title><title>Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures</title><description>Surface charge on insulating samples can be a significant source of error for scanning probe microscopes. We have found that it is possible to operate a scanning force microscope in a manner that makes it relatively immune to charge-induced forces while still allowing the probe tip to nondestructively follow the surface topography. The need to maintain close charge balance on the sample is thus obviated. We have used this strategy to perform critical dimension measurements on optical photomasks with the Surface/Interface Stylus NanoProfilometer. This instrument incorporates a servoed force-balance sensor. Surface topography is determined by touching the surface with contact forces between 0.1 and 1 μN.</description><subject>Atomic force microscopy</subject><subject>Electric charge</subject><subject>Force measurement</subject><subject>Measurement errors</subject><subject>Nondestructive examination</subject><subject>Probes</subject><subject>Sensors</subject><issn>0734-211X</issn><issn>1071-1023</issn><issn>1520-8567</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2000</creationdate><recordtype>article</recordtype><recordid>eNp90E1LAzEQBuAgCtbqwX-wN1FYndlskl1vUvyCggcVvIU0O2lXtklNtkL_vSstehA8zTA8vAwvY6cIl4gor_ASOXJRyT02QlFAXgmp9tkIFC_zAvHtkB2l9A4AUnA-YtfP1njf-nm2imFG2ZL6GLow32Stz_oFDWdK5C1lwWVpHZ0ZVrswcU7H7MCZLtHJbo7Z693ty-Qhnz7dP05uprnlRd3nOJMcDZrSCTLcSgAONFyqxlGDynFVY4FUN9BwJCkqC6ZUAKpW1tHM8DE72-YOH36sKfV62SZLXWc8hXXSqhR1WYJSgzzfShtDSpGcXsV2aeJGI-jvejTqXT2DvdjaZNve9G3wP_gzxF-oV437D_9N_gLKvnKg</recordid><startdate>200011</startdate><enddate>200011</enddate><creator>Griffith, J. E.</creator><creator>Kneedler, E. M.</creator><creator>Ningen, S.</creator><creator>Berghaus, A.</creator><creator>Bryson, C. E.</creator><creator>Pau, S.</creator><creator>Houge, E.</creator><creator>Shofner, T.</creator><scope>AAYXX</scope><scope>CITATION</scope><scope>7TC</scope></search><sort><creationdate>200011</creationdate><title>Scanning probe metrology in the presence of surface charge</title><author>Griffith, J. E. ; Kneedler, E. M. ; Ningen, S. ; Berghaus, A. ; Bryson, C. E. ; Pau, S. ; Houge, E. ; Shofner, T.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c329t-1b631a1a4f5ea3c60030e31a8dfed17f379121e9d0d31e658c0a4700797cfeba3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2000</creationdate><topic>Atomic force microscopy</topic><topic>Electric charge</topic><topic>Force measurement</topic><topic>Measurement errors</topic><topic>Nondestructive examination</topic><topic>Probes</topic><topic>Sensors</topic><toplevel>online_resources</toplevel><creatorcontrib>Griffith, J. E.</creatorcontrib><creatorcontrib>Kneedler, E. M.</creatorcontrib><creatorcontrib>Ningen, S.</creatorcontrib><creatorcontrib>Berghaus, A.</creatorcontrib><creatorcontrib>Bryson, C. E.</creatorcontrib><creatorcontrib>Pau, S.</creatorcontrib><creatorcontrib>Houge, E.</creatorcontrib><creatorcontrib>Shofner, T.</creatorcontrib><collection>CrossRef</collection><collection>Mechanical Engineering Abstracts</collection><jtitle>Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Griffith, J. E.</au><au>Kneedler, E. M.</au><au>Ningen, S.</au><au>Berghaus, A.</au><au>Bryson, C. E.</au><au>Pau, S.</au><au>Houge, E.</au><au>Shofner, T.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Scanning probe metrology in the presence of surface charge</atitle><jtitle>Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures</jtitle><date>2000-11</date><risdate>2000</risdate><volume>18</volume><issue>6</issue><spage>3264</spage><epage>3267</epage><pages>3264-3267</pages><issn>0734-211X</issn><issn>1071-1023</issn><eissn>1520-8567</eissn><coden>JVTBD9</coden><abstract>Surface charge on insulating samples can be a significant source of error for scanning probe microscopes. We have found that it is possible to operate a scanning force microscope in a manner that makes it relatively immune to charge-induced forces while still allowing the probe tip to nondestructively follow the surface topography. The need to maintain close charge balance on the sample is thus obviated. We have used this strategy to perform critical dimension measurements on optical photomasks with the Surface/Interface Stylus NanoProfilometer. This instrument incorporates a servoed force-balance sensor. Surface topography is determined by touching the surface with contact forces between 0.1 and 1 μN.</abstract><doi>10.1116/1.1313586</doi><tpages>4</tpages><oa>free_for_read</oa></addata></record> |
fulltext | fulltext |
identifier | ISSN: 0734-211X |
ispartof | Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2000-11, Vol.18 (6), p.3264-3267 |
issn | 0734-211X 1071-1023 1520-8567 |
language | eng |
recordid | cdi_scitation_primary_10_1116_1_1313586 |
source | American Institute of Physics:Jisc Collections:Transitional Journals Agreement 2021-23 (Reading list) |
subjects | Atomic force microscopy Electric charge Force measurement Measurement errors Nondestructive examination Probes Sensors |
title | Scanning probe metrology in the presence of surface charge |
url | http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-04T06%3A20%3A43IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_scita&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Scanning%20probe%20metrology%20in%20the%20presence%20of%20surface%20charge&rft.jtitle=Journal%20of%20Vacuum%20Science%20&%20Technology%20B:%20Microelectronics%20and%20Nanometer%20Structures&rft.au=Griffith,%20J.%20E.&rft.date=2000-11&rft.volume=18&rft.issue=6&rft.spage=3264&rft.epage=3267&rft.pages=3264-3267&rft.issn=0734-211X&rft.eissn=1520-8567&rft.coden=JVTBD9&rft_id=info:doi/10.1116/1.1313586&rft_dat=%3Cproquest_scita%3E745944077%3C/proquest_scita%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c329t-1b631a1a4f5ea3c60030e31a8dfed17f379121e9d0d31e658c0a4700797cfeba3%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_pqid=745944077&rft_id=info:pmid/&rfr_iscdi=true |