High fidelity blazed grating replication using nanoimprint lithography

We report progress in using nanoimprint lithography to fabricate high fidelity blazed diffraction gratings. Anisotropically etched silicon gratings with 200 nm period and 7.5° blaze angle were successfully replicated onto 100 mm diameter wafers with subnanometer roughness and excellent profile confo...

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Bibliographic Details
Published in:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 2004-11, Vol.22 (6), p.3260-3264
Main Authors: Chang, Chih-Hao, Montoya, J. C., Akilian, M., Lapsa, A., Heilmann, R. K., Schattenburg, M. L., Li, M., Flanagan, K. A., Rasmussen, A. P., Seely, J. F., Laming, J. M., Kjornrattanawanich, B., Goray, L. I.
Format: Article
Language:English
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Summary:We report progress in using nanoimprint lithography to fabricate high fidelity blazed diffraction gratings. Anisotropically etched silicon gratings with 200 nm period and 7.5° blaze angle were successfully replicated onto 100 mm diameter wafers with subnanometer roughness and excellent profile conformity. Out-of-plane distortion induced by residual stress from polymer films was also analyzed and found to be extremely low. The replicated blazed gratings were tested and demonstrated high x-ray diffraction efficiencies. This process was developed for fabricating blazed diffraction gratings for the NASA Constellation-X x-ray telescope.
ISSN:0734-211X
1071-1023
1520-8567
DOI:10.1116/1.1809614