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SiO2/TiO2 distributed Bragg reflector near 1.5 μm fabricated by e-beam evaporation
The authors report on the fabrication and characterization of SiO2/TiO2 distributed Bragg reflector (DBR) mirrors operating at the eye safe and optical communication wavelength window, λ = 1.5 μm. Our experimental results demonstrated that SiO2/TiO2 DBR mirrors with reflectivity exceeding 95% at λ =...
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Published in: | Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vacuum, surfaces, and films, 2013-11, Vol.31 (6) |
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Main Authors: | , , , , |
Format: | Article |
Language: | English |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | The authors report on the fabrication and characterization of SiO2/TiO2 distributed Bragg reflector (DBR) mirrors operating at the eye safe and optical communication wavelength window, λ = 1.5 μm. Our experimental results demonstrated that SiO2/TiO2 DBR mirrors with reflectivity exceeding 95% at λ = 1.5 μm can be achieved using e-beam evaporation in conjunction with postdeposition thermal annealing process in ambient air. It was found that the postdeposition annealing process transformed the crystal structure of the as-deposited TixOy to TiO2, leading to a significant reduction in optical absorption. Erbium doped III-nitride semiconductors incorporating DBR mirrors at 1.5 μm emission may open up many novel applications, including infrared emitters, optical amplifiers, and high power infrared lasers. |
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ISSN: | 0734-2101 1520-8559 |
DOI: | 10.1116/1.4823705 |