High fidelity 3D thermal nanoimprint with UV curable polydimethyl siloxane stamps

• Published in: Journal of vacuum science and technology. B, Nanotechnology & microelectronics Nanotechnology & microelectronics, 2016-11, Vol.34 (6)
• Main Authors: Chidambaram, Nachiappan, Kirchner, Robert, Altana, Mirco, Schift, Helmut
• Format: Article
• Language: English
• ISSN: 2166-2746; 2166-2754
• DOI: 10.1116/1.4961250

A two-step replication process chain is developed for a microlens array structure with deep three dimensional (3D) reliefs and sharp features enabling the transfer of a photocured acrylic resist patterns into thermoplastic poly-methyl methacrylate (PMMA) with the same structural polarity via an intermediate stamp. By using ultraviolet (UV)-curable polydimethyl siloxane (PDMS), high fidelity negatives were cast from the original microstructures made by two-photon-polymerization and subsequently replicated into PMMA using thermal imprint. The mechanical properties of the new UV-PDMS (X-34-4184, Shin-Etsu Chemical Company, Ltd.), along with its nearly zero process shrinkage, proved to be highly suitable to replicate both 50 μm high concave features and sharp tips with an apex diameter of 500 nm. The results prove that silicone rubber, despite its elasticity, has specific advantages in thermal imprint in structures where both tall microstructures and submicron surface structures have to be replicated. This way, high fidelity PMMA structures with low defects could be prepared by the optimized processing found in this work to have a replication of 3D masters for further upscaling.