Loading…
Exploring the fabrication of Co and Mn nanostructures with focused soft x-ray beam induced deposition
Focused soft X-ray beam induced deposition of metallic deposits from metal organic precursors is a promising novel technique for additive nanostructure fabrication. In the present work, the authors present a comparative study for deposition and in situ characterization of Co and Mn nanostructures in...
Saved in:
Published in: | Journal of vacuum science and technology. B, Nanotechnology & microelectronics Nanotechnology & microelectronics, 2017-05, Vol.35 (3) |
---|---|
Main Authors: | , , , , , , |
Format: | Article |
Language: | English |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
cited_by | cdi_FETCH-LOGICAL-c334t-b488d1834014d7ad86b85b734ccd56227e58cc2212f7d82cbbe636da38b427ba3 |
---|---|
cites | cdi_FETCH-LOGICAL-c334t-b488d1834014d7ad86b85b734ccd56227e58cc2212f7d82cbbe636da38b427ba3 |
container_end_page | |
container_issue | 3 |
container_start_page | |
container_title | Journal of vacuum science and technology. B, Nanotechnology & microelectronics |
container_volume | 35 |
creator | Tu, Fan Späth, Andreas Drost, Martin Vollnhals, Florian Krick Calderon, Sandra Fink, Rainer H. Marbach, Hubertus |
description | Focused soft X-ray beam induced deposition of metallic deposits from metal organic
precursors is a promising novel technique for additive nanostructure fabrication. In the
present work, the authors present a comparative study for deposition and in
situ characterization of Co and Mn nanostructures in a scanning transmission
x-ray
microscope. The authors detect a significant selectivity of the deposition process with
respect to the incident photon energy that arises from the enhanced x-ray
absorption
cross section of the precursor molecules for near-threshold excitation. This effect has
been investigated for the L
2,3-edges of the respective metal
centers of two different precursor molecules as well as the N and O
K-edges of the respective ligands. The authors find a photon-limited
growth mode for deposition from cobalt tricarbonyl nitrosyl [Co(CO)3NO], while the process
is precursor-limited for methylcyclopentadienyl manganese tricarbonyl
[MeCpMn(CO)3] possibly due to a comparably low vapor pressure of the latter
precursor. |
doi_str_mv | 10.1116/1.4979274 |
format | article |
fullrecord | <record><control><sourceid>scitation_cross</sourceid><recordid>TN_cdi_scitation_primary_10_1116_1_4979274</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>scitation_primary_10_1116_1_4979274</sourcerecordid><originalsourceid>FETCH-LOGICAL-c334t-b488d1834014d7ad86b85b734ccd56227e58cc2212f7d82cbbe636da38b427ba3</originalsourceid><addsrcrecordid>eNp9kE1LAzEURYMoWGoX_oNsFaZOPiZJl1KqFSpudD3k00baZEgy2v57W1vqQvBt3uNyOPAuANeoHiOE2B0a0wmfYE7PwAAjxirMG3p-uim7BKOcP-rdMNHUpB4AO9t0q5h8eIdlaaGTKnkti48BRgenEcpg4HOAQYaYS-p16ZPN8MuXJXRR99kamKMrcFMluYXKyjX0wfR6lxvbxez3ritw4eQq29FxD8Hbw-x1Oq8WL49P0_tFpQmhpVJUCIMEoTWihksjmBKN4oRqbRqGMbeN0BpjhB03AmulLCPMSCIUxVxJMgQ3B69OMedkXdslv5Zp26K63VfUovZY0Y69PbBZ-_Lz8Qn-jOkXbDvj_oP_mr8BVAJ13w</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Exploring the fabrication of Co and Mn nanostructures with focused soft x-ray beam induced deposition</title><source>American Institute of Physics:Jisc Collections:Transitional Journals Agreement 2021-23 (Reading list)</source><creator>Tu, Fan ; Späth, Andreas ; Drost, Martin ; Vollnhals, Florian ; Krick Calderon, Sandra ; Fink, Rainer H. ; Marbach, Hubertus</creator><creatorcontrib>Tu, Fan ; Späth, Andreas ; Drost, Martin ; Vollnhals, Florian ; Krick Calderon, Sandra ; Fink, Rainer H. ; Marbach, Hubertus</creatorcontrib><description>Focused soft X-ray beam induced deposition of metallic deposits from metal organic
precursors is a promising novel technique for additive nanostructure fabrication. In the
present work, the authors present a comparative study for deposition and in
situ characterization of Co and Mn nanostructures in a scanning transmission
x-ray
microscope. The authors detect a significant selectivity of the deposition process with
respect to the incident photon energy that arises from the enhanced x-ray
absorption
cross section of the precursor molecules for near-threshold excitation. This effect has
been investigated for the L
2,3-edges of the respective metal
centers of two different precursor molecules as well as the N and O
K-edges of the respective ligands. The authors find a photon-limited
growth mode for deposition from cobalt tricarbonyl nitrosyl [Co(CO)3NO], while the process
is precursor-limited for methylcyclopentadienyl manganese tricarbonyl
[MeCpMn(CO)3] possibly due to a comparably low vapor pressure of the latter
precursor.</description><identifier>ISSN: 2166-2746</identifier><identifier>EISSN: 2166-2754</identifier><identifier>DOI: 10.1116/1.4979274</identifier><identifier>CODEN: JVTBD9</identifier><language>eng</language><ispartof>Journal of vacuum science and technology. B, Nanotechnology & microelectronics, 2017-05, Vol.35 (3)</ispartof><rights>American Vacuum Society</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c334t-b488d1834014d7ad86b85b734ccd56227e58cc2212f7d82cbbe636da38b427ba3</citedby><cites>FETCH-LOGICAL-c334t-b488d1834014d7ad86b85b734ccd56227e58cc2212f7d82cbbe636da38b427ba3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27923,27924</link.rule.ids></links><search><creatorcontrib>Tu, Fan</creatorcontrib><creatorcontrib>Späth, Andreas</creatorcontrib><creatorcontrib>Drost, Martin</creatorcontrib><creatorcontrib>Vollnhals, Florian</creatorcontrib><creatorcontrib>Krick Calderon, Sandra</creatorcontrib><creatorcontrib>Fink, Rainer H.</creatorcontrib><creatorcontrib>Marbach, Hubertus</creatorcontrib><title>Exploring the fabrication of Co and Mn nanostructures with focused soft x-ray beam induced deposition</title><title>Journal of vacuum science and technology. B, Nanotechnology & microelectronics</title><description>Focused soft X-ray beam induced deposition of metallic deposits from metal organic
precursors is a promising novel technique for additive nanostructure fabrication. In the
present work, the authors present a comparative study for deposition and in
situ characterization of Co and Mn nanostructures in a scanning transmission
x-ray
microscope. The authors detect a significant selectivity of the deposition process with
respect to the incident photon energy that arises from the enhanced x-ray
absorption
cross section of the precursor molecules for near-threshold excitation. This effect has
been investigated for the L
2,3-edges of the respective metal
centers of two different precursor molecules as well as the N and O
K-edges of the respective ligands. The authors find a photon-limited
growth mode for deposition from cobalt tricarbonyl nitrosyl [Co(CO)3NO], while the process
is precursor-limited for methylcyclopentadienyl manganese tricarbonyl
[MeCpMn(CO)3] possibly due to a comparably low vapor pressure of the latter
precursor.</description><issn>2166-2746</issn><issn>2166-2754</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2017</creationdate><recordtype>article</recordtype><recordid>eNp9kE1LAzEURYMoWGoX_oNsFaZOPiZJl1KqFSpudD3k00baZEgy2v57W1vqQvBt3uNyOPAuANeoHiOE2B0a0wmfYE7PwAAjxirMG3p-uim7BKOcP-rdMNHUpB4AO9t0q5h8eIdlaaGTKnkti48BRgenEcpg4HOAQYaYS-p16ZPN8MuXJXRR99kamKMrcFMluYXKyjX0wfR6lxvbxez3ritw4eQq29FxD8Hbw-x1Oq8WL49P0_tFpQmhpVJUCIMEoTWihksjmBKN4oRqbRqGMbeN0BpjhB03AmulLCPMSCIUxVxJMgQ3B69OMedkXdslv5Zp26K63VfUovZY0Y69PbBZ-_Lz8Qn-jOkXbDvj_oP_mr8BVAJ13w</recordid><startdate>201705</startdate><enddate>201705</enddate><creator>Tu, Fan</creator><creator>Späth, Andreas</creator><creator>Drost, Martin</creator><creator>Vollnhals, Florian</creator><creator>Krick Calderon, Sandra</creator><creator>Fink, Rainer H.</creator><creator>Marbach, Hubertus</creator><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>201705</creationdate><title>Exploring the fabrication of Co and Mn nanostructures with focused soft x-ray beam induced deposition</title><author>Tu, Fan ; Späth, Andreas ; Drost, Martin ; Vollnhals, Florian ; Krick Calderon, Sandra ; Fink, Rainer H. ; Marbach, Hubertus</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c334t-b488d1834014d7ad86b85b734ccd56227e58cc2212f7d82cbbe636da38b427ba3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2017</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Tu, Fan</creatorcontrib><creatorcontrib>Späth, Andreas</creatorcontrib><creatorcontrib>Drost, Martin</creatorcontrib><creatorcontrib>Vollnhals, Florian</creatorcontrib><creatorcontrib>Krick Calderon, Sandra</creatorcontrib><creatorcontrib>Fink, Rainer H.</creatorcontrib><creatorcontrib>Marbach, Hubertus</creatorcontrib><collection>CrossRef</collection><jtitle>Journal of vacuum science and technology. B, Nanotechnology & microelectronics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Tu, Fan</au><au>Späth, Andreas</au><au>Drost, Martin</au><au>Vollnhals, Florian</au><au>Krick Calderon, Sandra</au><au>Fink, Rainer H.</au><au>Marbach, Hubertus</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Exploring the fabrication of Co and Mn nanostructures with focused soft x-ray beam induced deposition</atitle><jtitle>Journal of vacuum science and technology. B, Nanotechnology & microelectronics</jtitle><date>2017-05</date><risdate>2017</risdate><volume>35</volume><issue>3</issue><issn>2166-2746</issn><eissn>2166-2754</eissn><coden>JVTBD9</coden><abstract>Focused soft X-ray beam induced deposition of metallic deposits from metal organic
precursors is a promising novel technique for additive nanostructure fabrication. In the
present work, the authors present a comparative study for deposition and in
situ characterization of Co and Mn nanostructures in a scanning transmission
x-ray
microscope. The authors detect a significant selectivity of the deposition process with
respect to the incident photon energy that arises from the enhanced x-ray
absorption
cross section of the precursor molecules for near-threshold excitation. This effect has
been investigated for the L
2,3-edges of the respective metal
centers of two different precursor molecules as well as the N and O
K-edges of the respective ligands. The authors find a photon-limited
growth mode for deposition from cobalt tricarbonyl nitrosyl [Co(CO)3NO], while the process
is precursor-limited for methylcyclopentadienyl manganese tricarbonyl
[MeCpMn(CO)3] possibly due to a comparably low vapor pressure of the latter
precursor.</abstract><doi>10.1116/1.4979274</doi><tpages>7</tpages><oa>free_for_read</oa></addata></record> |
fulltext | fulltext |
identifier | ISSN: 2166-2746 |
ispartof | Journal of vacuum science and technology. B, Nanotechnology & microelectronics, 2017-05, Vol.35 (3) |
issn | 2166-2746 2166-2754 |
language | eng |
recordid | cdi_scitation_primary_10_1116_1_4979274 |
source | American Institute of Physics:Jisc Collections:Transitional Journals Agreement 2021-23 (Reading list) |
title | Exploring the fabrication of Co and Mn nanostructures with focused soft x-ray beam induced deposition |
url | http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-09T04%3A12%3A40IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-scitation_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Exploring%20the%20fabrication%20of%20Co%20and%20Mn%20nanostructures%20with%20focused%20soft%20x-ray%20beam%20induced%20deposition&rft.jtitle=Journal%20of%20vacuum%20science%20and%20technology.%20B,%20Nanotechnology%20&%20microelectronics&rft.au=Tu,%20Fan&rft.date=2017-05&rft.volume=35&rft.issue=3&rft.issn=2166-2746&rft.eissn=2166-2754&rft.coden=JVTBD9&rft_id=info:doi/10.1116/1.4979274&rft_dat=%3Cscitation_cross%3Escitation_primary_10_1116_1_4979274%3C/scitation_cross%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c334t-b488d1834014d7ad86b85b734ccd56227e58cc2212f7d82cbbe636da38b427ba3%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |