Silicon micromachining for millimeter-wave applications

We present in this article a very low loss silicon micromachined coplanar technology. The design of the structures was achieved through three dimensional finite element method electromagnetic simulations. A silicon micromachined cavity resonating at 95 GHz with a quality factor greater than 9000 was...

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Bibliographic Details
Published in:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films Surfaces, and Films, 2000-03, Vol.18 (2), p.743-745
Main Authors: Guillon, B., Grenier, K., Pons, P., Cazaux, J. L., Lalaurie, J. C., Cros, D., Plana, R.
Format: Article
Language:English
Subjects:
Computer simulation
Electric losses
Finite element method
Micromachining
Millimeter wave devices
Quality control
Reactive ion etching
Semiconductor device structures
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Summary:We present in this article a very low loss silicon micromachined coplanar technology. The design of the structures was achieved through three dimensional finite element method electromagnetic simulations. A silicon micromachined cavity resonating at 95 GHz with a quality factor greater than 9000 was realized.
ISSN:0734-2101
1520-8559
DOI:10.1116/1.582170