Factors affecting fabrication of silicon nanopillars using silica nanoparticle lithography and metal-assisted chemical etching

Different technologies have been explored for fabricating silicon nanopillars (SiNPs). One of the emerging technologies is the combined fabrication process based on silica nanoparticle lithography and metal-assisted chemical etching (MACE). However, the process flow to fabricate successfully SiNPs d...

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Bibliographic Details
Published in:Journal of micro/nanolithography, MEMS, and MOEMS MEMS, and MOEMS, 2022-01, Vol.21 (1), p.011007-011007
Main Authors: Van Minh, Nguyen, Van Hieu, Dang, Lien, Nghiem Thi Ha, Hoang, Chu Manh
Format: Article
Language:English
Online Access:Get full text
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Summary:Different technologies have been explored for fabricating silicon nanopillars (SiNPs). One of the emerging technologies is the combined fabrication process based on silica nanoparticle lithography and metal-assisted chemical etching (MACE). However, the process flow to fabricate successfully SiNPs depends on various technology factors. We report investigations on factors affecting the fabrication technology, from the assembly of close-packed silica nanoparticle monolayers using drop-coating method, formation of nonclose packed silica nanoparticle monolayers using HF vapor etching, to creation of SiNPs using MACE. Etching mechanisms are suggested to explain observed experiment results.
ISSN:1932-5150
1932-5134
DOI:10.1117/1.JMM.21.1.011007