Simulating semiconductor structures for next-generation optical inspection technologies

We present a technique for optimizing advanced optical imaging methods for nanoscale structures, such as those encountered in the inspection of cutting-edge semiconductor devices. The optimization flow is divided to two parts: simulating light-structure interaction using the finite-difference time-d...

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Bibliographic Details
Published in:Optical engineering 2016-02, Vol.55 (2), p.025102-025102
Main Authors: Golani, Ori, Dolev, Ido, Pond, James, Niegemann, Jens
Format: Article
Language:English
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Summary:We present a technique for optimizing advanced optical imaging methods for nanoscale structures, such as those encountered in the inspection of cutting-edge semiconductor devices. The optimization flow is divided to two parts: simulating light-structure interaction using the finite-difference time-domain (FDTD) method and simulating the optical imaging system by means of its optical transfer function. As a case study, FDTD is used to simulate 10-nm silicon line-space and static random-access memory patterns, with irregular structural protrusions and silicon-oxide particles as defects of interest. An ultraviolet scanning-spot optical microscope is used to detect these defects, and the optimization flow is used to find the optimal imaging mode for detection.
ISSN:0091-3286
1560-2303
DOI:10.1117/1.OE.55.2.025102